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John Weaver serves as the Facility Manager for the Birck
Nanotechnology Center at Purdue University. He is responsible for
the facility infrastructure, safety and training activities, and
cleanroom and laboratory operations. John received his BS degree in
Chemistry at Adrian College in 1972, and joined RCA Solid State
Division in process engineering in the world’s first production CMOS
fabrication facility. In 1975 he moved to Hughes Aircraft Company’s
Solid State Products Division in Newport Beach, California, where he
continued his role in high-volume manufacturing-support engineering.
In 1977, he moved to what is now Delphi Corporation in Kokomo,
Indiana. During his career, John has been involved in a variety of
roles in semiconductor process support, process development, and
processing facilities development. John has published numerous
papers in both the process development and contamination control
fields, has two patents in process development, and authored a book
and a book chapter in contamination control technology. He has
taught a wide variety of industry short-courses, and is the recipient
of the Willis J. Whitfield Award for contributions to the field of
contamination control. He is a Senior Member of the Institute for
Environmental Sciences and Technology, President of the Indiana
Chapter, member of the Editorial Board for the Journal of the IEST,
and is a Principal Member of the NFPA 318 committee, which writes
fire standards for cleanrooms. He has been involved in the design,
construction, and/or operation of more than 25 cleanrooms and clean
facilities during his career.
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