John Weaver serves as the Facility Manager for the Birck[[BR]]Nanotechnology Center at Purdue University. He is responsible for[[BR]]the facility infrastructure, safety and training activities, and[[BR]]cleanroom and laboratory operations. John received his BS degree in[[BR]]Chemistry at Adrian College in 1972, and joined RCA Solid State[[BR]]Division in process engineering in the world’s first production CMOS[[BR]]fabrication facility. In 1975 he moved to Hughes Aircraft Company’s[[BR]]Solid State Products Division in Newport Beach, California, where he[[BR]]continued his role in high-volume manufacturing-support engineering.[[BR]]In 1977, he moved to what is now Delphi Corporation in Kokomo,[[BR]]Indiana. During his career, John has been involved in a variety of[[BR]]roles in semiconductor process support, process development, and[[BR]]processing facilities development. John has published numerous[[BR]]papers in both the process development and contamination control[[BR]]fields, has two patents in process development, and authored a book[[BR]]and a book chapter in contamination control technology. He has[[BR]]taught a wide variety of industry short-courses, and is the recipient[[BR]]of the Willis J. Whitfield Award for contributions to the field of[[BR]]contamination control. He is a Senior Member of the Institute for[[BR]]Environmental Sciences and Technology, President of the Indiana[[BR]]Chapter, member of the Editorial Board for the Journal of the IEST,[[BR]]and is a Principal Member of the NFPA 318 committee, which writes[[BR]]fire standards for cleanrooms. He has been involved in the design,[[BR]]construction, and/or operation of more than 25 cleanrooms and clean[[BR]]facilities during his career.