1. Process Lab: Concentration Dependent Diffusion

   PLG_GROUPS_RESOURCES_THIS_HAS 10.0 Ranking

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   total: updated 19 Jun 2013
   Users:	907
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   Avg. exec. time:	2 secs

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   Google/IEEE
   Avg. Review:	0.0 out of 5 stars
   Citations:

   09 Oct 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin

   Simulates the dopant diffusion process in integrated circuit fabrication

2. Process Lab: Oxidation

   PLG_GROUPS_RESOURCES_THIS_HAS 10.0 Ranking

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   total: updated 19 Jun 2013
   Users:	732
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   Avg. exec. time:	35 mins

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   Google/IEEE
   Avg. Review:	5.0 out of 5 stars
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   09 Oct 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin

   Simulates the oxidation process in integrated circuit fabrication

3. Process Lab: Oxidation Flux

   PLG_GROUPS_RESOURCES_THIS_HAS 10.0 Ranking

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   total: updated 19 Jun 2013
   Users:	300
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   Avg. exec. time:	2 hours

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   Google/IEEE
   Avg. Review:	0.0 out of 5 stars
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   09 Oct 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin

   Simulates the oxidation flux in the oxide growth process in integrated circuit fabrication

4. Process Lab: Point Defect Coupled Diffusion

   PLG_GROUPS_RESOURCES_THIS_HAS 8.7 Ranking

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   total: updated 19 Jun 2013
   Users:	235
   Jobs:	1963
   Avg. exec. time:	2 secs

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   Google/IEEE
   Avg. Review:	3.0 out of 5 stars
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   09 Oct 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin

   Simulates the point-defect-coupled diffusion process in integrated circuit fabrication

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