1. Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)

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   13 Feb 2006 | Online Presentations | Contributor(s): Peide "Peter" Ye

   Atomic layer deposition (ALD) is an emerging nanotechnology enables the deposit of ultrathin films, one atomic layer by one atomic layer. ALD provides a powerful, new capability to grow or regrow nanoscale ultrathin films of metals, semiconductors and insulators. This presentation introduces ALD …

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