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Home › Groups › Dragica Vasileska Contributions on the nanoHUB › Resources › Series › Process Modeling › About
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Process Modeling

By Dragica Vasileska

Arizona State University

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Dragica Vasileska Contributions on the nanoHUB

This resource belongs to the Dragica Vasileska Contributions on the nanoHUB group.

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Abstract

This series on process modeling describes key process modeling steps such as implantation, diffusion, oxidation, etching, deposition, etc.

Cite this work

Researchers should cite this work as follows:

  • Dragica Vasileska (2011), "Process Modeling," https://nanohub.org/resources/11909.

Tags

  1. diffusion
  2. ion implantation
  3. nanoelectronics
  4. oxidation
  5. processing
  6. process modeling

In This Series

  1. Silvaco Athena - Part 1

    This resource has a 0.0 Ranking

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    Usage Stats
    Total: updated 03 May 2013
    Users: 401
    Reviews & Citations
    Google/IEEE
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    Citations:

    04 Aug 2011 | Teaching Materials | Contributor(s): Dragica Vasileska

    This is part of a series of lectures on process modeling. In this lecture some introductory concepts are described followed by a description of the ion implantation process.

  2. Silvaco Athena - Part 2

    This resource has a 0.0 Ranking

    Ranking is calculated from a formula comprised of user reviews and usage data. Learn more ›

    Usage Stats
    Total: updated 03 May 2013
    Users: 405
    Reviews & Citations
    Google/IEEE
    Avg. Review: 0.0 out of 5 stars
    Citations:

    04 Aug 2011 | Teaching Materials | Contributor(s): Dragica Vasileska

    This set of powerpoint slides describes the diffusion and the oxidation process. Also briefly described are etching and epitaxy process.

  3. Silvaco Athena - Part 3

    This resource has a 0.0 Ranking

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    Usage Stats
    Total: updated 03 May 2013
    Users: 990
    Reviews & Citations
    Google/IEEE
    Avg. Review: 0.0 out of 5 stars
    Citations:

    09 Aug 2011 | Teaching Materials | Contributor(s): Dragica Vasileska

    This set of slides describes the fabrication of 100 nm channel length MOSFET device. At the end the formation of Bird's Beaks is discussed.

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