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Device Reliability Tool

By Ahmad Ehteshamul Islam1, HALDUN KUFLUOGLU2, Muhammad A. Alam2

1. Air Force Research Laboratory 2. Purdue University

Analyzes device reliability based on NBTI

Launch Tool

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Archive Version 1.1.1
Published on 19 Oct 2009
Latest version: 2.1. All versions

doi:10.4231/D3183424T cite this

This tool is closed source.

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Abstract

DevRel contains a demonstration of Negative Bias Temperature Instability (NBTI), which is a major reliability issue for nanoscale MOS devices. When a device is stressed at negative voltage, depassivation of SiH bonds in the interface occurs. As a result, interface traps are generated (reaction) and the resulting hydrogen species diffuses away from the interface (diffusion). Hence, device characteristics (threshold voltage, mobility, drain current, etc) degrades with time and such degradation satisfies a power law (~ time^n) formula.

Implementing such Reaction-diffusion (RD) model, DevRel shows how threshold voltage of a PMOS device can change with time at different voltages and temperatures.


Negative Bias Temperature Instability Basics/Modeling

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