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272 users in 12 class(es)

Process Lab : Concentration-Dependent Diffusion

Stanford University

Integrated Circuit Fabrication Process Simulation : Simulates both the standard diffusion and concentration dependent diffusion

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Version 1 - published on 22 Sep 2006

doi:10254/nanohub-r1881.1 cite this

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Table 2: Users By Organization Type
#	Type	Users	Percent
1	Educational - University	506	71.77
2	Unidentified	141	20
3	Industry	48	6.81
4	Educational - Pre-College	7	0.99
5	Unemployed	6	0.85
6	Government Agency	4	0.57
7	National Lab	2	0.28
8	Military	1	0.14
	Total Users	705	100

Table 3: Users by Country of Residence
#	Country	Users	Percent
1	UNITED STATES	434	61.56
2	MACEDONIA, THE FORMER YUGOSLAV REPUBLIC OF	52	7.38
3	INDIA	21	2.98
4	TAIWAN	13	1.84
5	GERMANY	7	0.99
6	UNITED KINGDOM	5	0.71
7	BELGIUM	4	0.57
8	KOREA, REPUBLIC OF	4	0.57
9	ISRAEL	3	0.43
10	MALAYSIA	3	0.43
	Total Users	705	100

Table 4: Top Domains by User Count
#	Domains	Users	Percent
1	stanford.edu	157	22.27
2	Unidentified	148	20.99
3	cox.net	61	8.65
4	comcast.net	51	7.23
5	asu.edu	41	5.82
6	berkeley.edu	24	3.4
7	vt.edu	18	2.55
8	rr.com	18	2.55
9	purdue.edu	15	2.13
10	pacbell.net	15	2.13
	Total Users	705	100

Location of all "Process Lab : Concentration-Dependent Diffusion" Users Since Its Posting