Support

Support Options

Submit a Support Ticket

 
HomeResourcesToolsProcess Lab : Concentration-Dependent Diffusion › Usage

Process Lab : Concentration-Dependent Diffusion

By Shuqing (Victor) Cao, Yang Liu, Peter Griffin

Stanford University

Integrated Circuit Fabrication Process Simulation : Simulates both the standard diffusion and concentration dependent diffusion

Launch Tool

You must login before you can run this tool.

Version 1 - published on 22 Sep 2006

doi:10254/nanohub-r1881.1 cite this

This tool is closed source.

View All Supporting Documents

Usage

Table 1: Overview
Item Average Total
Simulation Users: - 705
Interactive Sessions: - 2,249
Simulation Sessions: - 17,413
Simulation Runs: - 19,659
Wall Clock Time: 39.73 minutes 480.4 days
CPU time: 2.17 seconds 10.52 hours
Interaction Time: 17.15 minutes 207.43 days

Table 2: Users By Organization Type
# Type Users Percent
1 Educational - University 506 71.77
2 Unidentified 141 20
3 Industry 48 6.81
4 Educational - Pre-College 7 0.99
5 Unemployed 6 0.85
6 Government Agency 4 0.57
7 National Lab 2 0.28
8 Military 1 0.14
Total Users 705 100
Table 3: Users by Country of Residence
# Country Users Percent
1 UNITED STATES 434 61.56
2 MACEDONIA, THE FORMER YUGOSLAV REPUBLIC OF 52 7.38
3 INDIA 21 2.98
4 TAIWAN 13 1.84
5 GERMANY 7 0.99
6 UNITED KINGDOM 5 0.71
7 BELGIUM 4 0.57
8 KOREA, REPUBLIC OF 4 0.57
9 ISRAEL 3 0.43
10 MALAYSIA 3 0.43
Total Users 705 100
Table 4: Top Domains by User Count
# Domains Users Percent
1 stanford.edu 157 22.27
2 Unidentified 148 20.99
3 cox.net 61 8.65
4 comcast.net 51 7.23
5 asu.edu 41 5.82
6 berkeley.edu 24 3.4
7 vt.edu 18 2.55
8 rr.com 18 2.55
9 purdue.edu 15 2.13
10 pacbell.net 15 2.13
Total Users 705 100

Location of all "Process Lab : Concentration-Dependent Diffusion" Users Since Its Posting

Map

nanoHUB.org, a resource for nanoscience and nanotechnology, is supported by the National Science Foundation and other funding agencies.