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272 users in 12 classes

Process Lab : Concentration-Dependent Diffusion

Stanford University

Integrated Circuit Fabrication Process Simulation : Simulates both the standard diffusion and concentration dependent diffusion

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Version 1 - published on 22 Sep 2006

DOI: 10254/nanohub-r1881.1 cite this

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Table 2: Users By Organization Type
#	Type	Users	Percent
1	Educational - University	506	80.19
2	Unidentified	58	9.19
3	Industry	48	7.61
4	Educational - Pre-College	7	1.11
5	Unemployed	6	0.95
6	Government Agency	4	0.63
7	National Lab	2	0.32
8	Military	1	0.16
	Total Users	631	100

Table 3: Users by Country of Residence
#	Country	Users	Percent
1	UNITED STATES	434	68.78
2	MACEDONIA, THE FORMER YUGOSLAV REPUBLIC OF	52	8.24
3	INDIA	21	3.33
4	TAIWAN	13	2.06
5	GERMANY	7	1.11
6	UNITED KINGDOM	5	0.79
7	KOREA, REPUBLIC OF	4	0.63
8	BELGIUM	4	0.63
9	FRANCE	3	0.48
10	POLAND	3	0.48
	Total Users	631	100

Table 4: Top Domains by User Count
#	Domains	Users	Percent
1	stanford.edu	157	24.88
2	Unidentified	128	20.29
3	comcast.net	48	7.61
4	cox.net	36	5.71
5	asu.edu	30	4.75
6	berkeley.edu	24	3.8
7	vt.edu	18	2.85
8	rr.com	16	2.54
9	purdue.edu	15	2.38
10	pacbell.net	15	2.38
	Total Users	631	100

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