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Process Lab : Defect-coupled diffusion
Integrated Circuit Fabrication Process Simulation : Simulates dopant diffusion coupled with point defects
Version 1 - published on 26 Sep 2006
doi:10254/nanohub-r1882.1 cite this
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3.0 out of 5 stars
Yaswanth Rangineni @ 01:30 PM on 19 Jan, 2007
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