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Process Lab : Defect-coupled diffusion

By Shuqing (Victor) Cao1, Yang Liu1, Peter Griffin1

1. Stanford University

Integrated Circuit Fabrication Process Simulation : Simulates dopant diffusion coupled with point defects

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Version 1 - published on 26 Sep 2006

doi:10.4231/D3XW47V8Z cite this

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    Yaswanth Rangineni

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