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Design in the Nanometer Regime: Process Variation
By Kaushik Roy
Purdue University
See also
- Part of: NCN Nanoelectronics: Tutorials
- Part of: Nanotechnology 501 Lecture Series
Category
Published on
Abstract
Scaling of technology over the last few decades has produced an exponential growth in computing power of integrated circuits and an unprecedented number of transistors integrated into a single. However, scaling is facing several problems — severe short channel effects, exponential increase in leakage current, increased process parameter variations, and new reliability concerns. Hence, reliable, low-power designs require a shift in design paradigm. We believe that device aware circuit and architecture design along with statistical design techniques can provide large improvement in power dissipation while providing the required reliability and yield. In the two lectures I will present device aware CMOS design to address power, reliability, and process variations in scaled technologies for different application domains — high-performance with power as constraint and ultra-low power with reasonable performance.
Sponsored by
NCN@Purdue Student Leadership Team Network for Computational Nanotechnology The Institute for Nanoelectronics and Computing
Cite this work
Researchers should cite this work as follows:
-
Kaushik Roy (2006), "Design in the Nanometer Regime: Process Variation," https://nanohub.org/resources/2018.
Time
Location
EE Building, Room 118