This course is a top-down approach to the fabrication of nanometer-scale (<100nm) structures. Principles of lithography, film deposition, reactive-ion etch and planarization are presented. The couse provides a survey of state-of-the-art nanofabrication techniques.
This course is intended for graduate students in science and engineering who are either i) interested in pursuing research in science and engineering at the nanoscale involving fabrication of materials, structures or devices, or ii) seeking the background necessary to understand and evaluate methods of nanofabrication as needed to assess the potential impact of nanotechnologies.
Minghao Qi received his B.S. degree in Chemical Physics from the University of Science and Technology of China in 1995. He received his M.S. and Ph.D. in Electrical Engineering from Massachusetts Institute of Technology in 1998 and 2005, respectively. He was a post-doctoral research associate in the Research Laboratory of Electronics at MIT before joining Purdue University as an assistant professor of Electrical and Computer Engineering in August 2005.
His research interests are nanotechnology and nanophotonics. In particular he is developing a "nano machine shop," where one can prototype, with accuracy and control, functional 3D nanodevices. Such devices include photonic crystals and integrated photonic circuits. He was the first one who demonstrated microcavity resonance in a 3D photonic crystal at optical wavelengths. He is a member of Sigma Xi, IEEE, MRS and OSA.
- Henry I. Smith, Submicron and Nanometer Technology, NanoStructures Press, Sudbury, MA 01776, 1994.
Cite this work
Researchers should cite this work as follows:
Electrical Engineering, Stanford University, Stanford, CA
- nano fabrication
- thin films