ECE 695Q: Nanometer Scale Patterning and Processing

By Minghao Qi

Electrical and Computer Engineering, Purdue University, West Lafayette, IN

Category

Courses

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Abstract

Spring 2016

This course is a top-down approach to the fabrication of nanometer-scale (<100nm) structures. Principles of lithography, film deposition, reactive-ion etch and planarization are presented. The couse provides a survey of state-of-the-art nanofabrication techniques.

This course is intended for graduate students in science and engineering who are either i) interested in pursuing research in science and engineering at the nanoscale involving fabrication of materials, structures or devices, or ii) seeking the background necessary to understand and evaluate methods of nanofabrication as needed to assess the potential impact of nanotechnologies.

Bio

Minghao Qi

Minghao Qi received his B.S. degree in Chemical Physics from the University of Science and Technology of China in 1995. He received his M.S. and Ph.D. in Electrical Engineering from Massachusetts Institute of Technology in 1998 and 2005, respectively. He was a post-doctoral research associate in the Research Laboratory of Electronics at MIT before joining Purdue University as an assistant professor of Electrical and Computer Engineering in August 2005.

 

His research interests are nanotechnology and nanophotonics. In particular he is developing a "nano machine shop," where one can prototype, with accuracy and control, functional 3D nanodevices. Such devices include photonic crystals and integrated photonic circuits. He was the first one who demonstrated microcavity resonance in a 3D photonic crystal at optical wavelengths. He is a member of Sigma Xi, IEEE, MRS and OSA.

References

Henry I. Smith, Submicron and Nanometer Technology, NanoStructures Press, Sudbury, MA 01776, 1994.

Cite this work

Researchers should cite this work as follows:

  • Minghao Qi (2016), "ECE 695Q: Nanometer Scale Patterning and Processing," http://nanohub.org/resources/24028.

    BibTex | EndNote

Location

Electrical Engineering, Stanford University, Stanford, CA

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Lecture Number/Topic Online Lecture Video Lecture Notes Supplemental Material Suggested Exercises
ECE 695Q Lecture 01: Introduction View HTML
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ECE 695Q Lecture 02: Overview of Lithography View HTML
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ECE 695Q Lecture 03: Lithography Used In Semiconductor Manufacturing View HTML
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ECE 695Q Lecture 04: Contamination Control and Substrate Cleaning View HTML
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ECE 695Q Lecture 05: Resist Technology View HTML
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ECE 695Q Lecture 06: Optical Lithography - Optical Imaging System View HTML
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ECE 695Q Lecture 07: Optical Lithography – Lithography System View HTML
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ECE 695Q Lecture 08: Optical Lithography – Alignment View HTML
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ECE 695Q Lecture 09: Optical Lithography - Position Detection View HTML
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ECE 695Q Lecture 10: Optical Lithography – Resolution Enhancement Techniques View HTML
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ECE 695Q Lecture 11: Optical Lithography – Resolution Enhancement Techniques II View HTML
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ECE 695Q Lecture 12: Optical Lithography – Contrast and Resolution in Microscopy and Lithography Systems View HTML
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ECE 695Q Lecture 13: Extreme UV (EUV) Lithography – Overview, Why EUV Lithography? View HTML
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ECE 695Q Lecture 14: Extreme UV (EUV) Lithography – EUV Source (Hot and Dense Plasma) View HTML
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ECE 695Q Lecture 15: Extreme UV (EUV) Lithography – Optics, Mask, Resist, and Contaminaton Control View HTML
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ECE 695Q Lecture 16: Electron Optics and Lithography I View Flash View Notes (pdf)
ECE 695Q Lecture 17: Electron Optics and Lithography II View HTML
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ECE 695Q Lecture 18: Electron Beam Lithography I View HTML
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ECE 695Q Lecture 19: Vector Beam Performance and Operation I View HTML
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ECE 695Q Lecture 20: Vector Beam Performance and Operation II View HTML
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ECE 695Q Lecture 21: E-Beam Lithography Process View HTML
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ECE 695Q Lecture 22: Shaped-Electron-Beam Lithography View HTML
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ECE 695Q Lecture 23: Nanofabrication with Focused Ion Beams – Overview & Ion Source and Optics View HTML
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ECE 695Q Leture 24: Nanofabrication with Focused Ion Beams – Ion-Solid Interaction, Damage View HTML
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ECE 695Q Lecture 25: Nanofabrication with Focused Ion Beams – Scanning Ion Beam Imaging View HTML
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ECE 695Q Lecture 26: Non-Lithographic Applications of FIB View HTML
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ECE 695Q Lecture 27: Non-Lithographic Applications of FIB II View HTML
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ECE 695Q Lecture 28: Focused Ion Beam Induced Deposition View HTML
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ECE 695Q Lecture 29: Focused Electron Beam Induced Deposition and Deposition Rate View HTML
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ECE 695Q Lecture 30: Deposit Composition (Carbon/Metal) View HTML
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ECE 695Q Lecture 31: Scanning Helium Ion Microscopy (SHIM) View HTML
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ECE 695Q Lecture 32: Nanoimprint Lithography (NIL) – Overview and Thermal NIL Resists View HTML
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ECE 695Q Lecture 33: Nanoimprint Lithography – Residual Layer After Nanoimprint View HTML
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ECE 695Q Lecture 34: Nanoimprint Lithography – Pattern Dependence in Nanoimprint View HTML
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ECE 695Q Lecture 35: Nanoimprint Lithography – UV Assisted Nanoimprint View HTML
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ECE 695Q Lecture 36: Nanoimprint Lithography (NIL) – Alignment in NIL View HTML
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ECE 695Q Lecture 37: Nanoimprint Lithography (NIL) - Resist for UV-NIL View HTML
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ECE 695Q Lecture 38: Nanoimprint Lithography (NIL) – NIL Mold Fabrication View HTML
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ECE 695Q Lecture 39: Nanoimprint Lithography (NIL) – NIL Tools View HTML
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ECE 695Q Lecture 40: Nanoimprint Lithography (NIL) – Other NIL Approaches View HTML
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ECE 695Q Lecture 41: Advanced Lithography I View HTML
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ECE 695Q Lecture 42: Advanced Lithography II View HTML
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ECE 695Q Lecture 43: Advanced Lithography III View HTML
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ECE 695Q Lecture 44: Etching View HTML
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ECE 695Q Lecture 45: Dry Etching I View HTML
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ECE 695Q Lecture 46: Dry Etching II View HTML
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ECE 695Q Lecture 47: Dry Etching III View HTML
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ECE 695Q Lecture 48: Planarization I View HTML
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ECE 695Q Lecture 49: Planarization II View HTML
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