ECE 695Q Lecture 44: Etching

By Minghao Qi

Electrical and Computer Engineering, Purdue University, West Lafayette, IN

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Researchers should cite this work as follows:

  • Minghao Qi (2016), "ECE 695Q Lecture 44: Etching," http://nanohub.org/resources/25159.

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226 Electrical Engineering, Purdue University, West Lafayette, IN

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ECE 695Q Lecture 44: Etching
  • Lecture 44 Etching 1. Lecture 44 Etching 0
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  • Etching 2. Etching 10.21021021021021
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  • What is Etching? 3. What is Etching? 41.07440774107441
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  • Selection/Engineering of Etch Masks 4. Selection/Engineering of Etch … 149.61628294961628
    00:00/00:00
  • Classification of Etch Processes 5. Classification of Etch Process… 305.3053053053053
    00:00/00:00
  • Wet etching 6. Wet etching 552.35235235235234
    00:00/00:00
  • Chemical Etching 7. Chemical Etching 618.0180180180181
    00:00/00:00
  • Wet Etching Kinetics 8. Wet Etching Kinetics 759.72639305972643
    00:00/00:00
  • Wet Chemical Etching 9. Wet Chemical Etching 959.35935935935936
    00:00/00:00
  • Wet Etching of SiO2 10. Wet Etching of SiO2 1114.8148148148148
    00:00/00:00
  • Wet etching of SiN and Si 11. Wet etching of SiN and Si 1358.4250917584252
    00:00/00:00
  • Wet etch of Metals 12. Wet etch of Metals 1667.9346012679346
    00:00/00:00
  • Frequently Used Wet Etchant 13. Frequently Used Wet Etchant 1880.1468134801469
    00:00/00:00
  • Anisotropic 14. Anisotropic 2007.273940607274
    00:00/00:00
  • Anisotropic Wet Etching in Si 15. Anisotropic Wet Etching in Si 2029.3960627293961
    00:00/00:00
  • Mechanism Hypothesis 16. Mechanism Hypothesis 2134.5345345345345
    00:00/00:00
  • Orientation Dependent Etch in Si 17. Orientation Dependent Etch in … 2483.9506172839506
    00:00/00:00
  • Orientation Dependent Etch at 10nm Line Width 18. Orientation Dependent Etch at … 2607.1071071071074
    00:00/00:00
  • One Method to Measure Etch Rate 19. One Method to Measure Etch Rat… 2699.9332665999332
    00:00/00:00
  • Hemispherical Specimen 20. Hemispherical Specimen 2733.9673006339676
    00:00/00:00
  • Etching Rate Contour Map for a KOH Solution 21. Etching Rate Contour Map for a… 2777.5442108775442
    00:00/00:00
  • Effect of Surfactant 22. Effect of Surfactant 2843.30997664331
    00:00/00:00
  • Surfactant Decreases Etch Rate 23. Surfactant Decreases Etch Rate 2932.132132132132
    00:00/00:00
  • Comparison with and without Surfactant 24. Comparison with and without Su… 3032.3323323323325
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  • Suppression of Mask-Corner Undercut 25. Suppression of Mask-Corner Und… 3147.8478478478478
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