Lab Exercise: Atomic Layer Deposition

By NACK Network

Nanotechnology Applications and Career Knowledge (NACK) Network

Published on

Abstract

The objective of this lab is to evaluate the atomic layer deposition (ALD) process. The ALD process will be used to deposit a transparent conducting oxide (TCO). Principles of resistance and resistivity will also be discussed.

Cite this work

Researchers should cite this work as follows:

  • NACK Network (2017), "Lab Exercise: Atomic Layer Deposition," http://nanohub.org/resources/25686.

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