Lab Exercise: Atomic Layer Deposition

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Abstract

The objective of this lab is to evaluate the atomic layer deposition (ALD) process. The ALD process will be used to deposit a transparent conducting oxide (TCO). Principles of resistance and resistivity will also be discussed.

Cite this work

Researchers should cite this work as follows:

  • NACK Network (2017), "Lab Exercise: Atomic Layer Deposition," http://nanohub.org/resources/25686.

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