Specific Resistivity for Copper Interconnects

This tool calculates the specific resistivity $rho(alpha,beta,gamma)$ based on the atomistic model describe in preprint arXiv:1701.04897

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Version 1.0 - published on 20 Nov 2017

doi:10.4231/D3FF3M25J cite this

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This tool is used as a compact model to describe grain boundary scattering in copper interconnects as  described in preprint arXiv:1701.04897. The model use a Neural network which shows the same accuracy than the TB model which was benchmarked as well to First principles calculations, but with a much lower computational burden.

Cite this work

Researchers should cite this work as follows:

  • Daniel A. Valencia-Hoyos; Zhengping Jiang; Gustavo A Valencia; Kuang-Chung Wang; Gerhard Klimeck; Michael Povolotskyi (2017), "Specific Resistivity for Copper Interconnects," http://nanohub.org/resources/resist. (DOI: 10.4231/D3FF3M25J).

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