Specific Resistivity for Copper Interconnects

This tool calculates the specific resistivity $rho(alpha,beta,gamma)$ based on the atomistic model describe in preprint arXiv:1701.04897

Launch Tool

You must login before you can run this tool.

Version 1.0 - published on 20 Nov 2017

doi:10.4231/D3FF3M25J cite this

This tool is closed source.

View All Supporting Documents

Category

Tools

Published on

Abstract

This tool is used as a compact model to describe grain boundary scattering in copper interconnects as  described in preprint arXiv:1701.04897. The model use a Neural network which shows the same accuracy than the TB model which was benchmarked as well to First principles calculations, but with a much lower computational burden.

Cite this work

Researchers should cite this work as follows:

  • Daniel A. Valencia-Hoyos, Zhengping Jiang, Gustavo A Valencia, Kuang-Chung Wang, Gerhard Klimeck, Michael Povolotskyi (2017), "Specific Resistivity for Copper Interconnects," https://nanohub.org/resources/resist. (DOI: 10.4231/D3FF3M25J).

    BibTex | EndNote

Tags