Nano Device Laboratories - Beyond More than Moore CMOS

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Abstract

NDL (National Nano Device Laboratories) is an important place to cultivate high-level technology talents for semiconductor and nano techniques in Taiwan. It has become a national open nano device process test environment, and provided a unique open experiment research environment for comprehensive turnkey consignment services. As MOSFETs are scaled down to sub-10nm and below, power consumption is the major limitation to maintain device performance well.

Bio

Wen-Kuan Yeh Wen-Kuan Yeh was born in Hsinchu, Taiwan in 1964. He received his Ph.D. in electronics engineering from National Chiao-Tung University, Taiwan in 1996. In 1989-90, he worked at Taiwan Semiconductor Manufacturing Corporation (tsmc) Research and Development Division to work on sub-um CMOSFET and his M.S. thesis. During 1996 to 2000, he joined Unite Microelectronic Corporation (UMC), Technology & Process Development Division, as a Research Scientist. He is currently a full Professor of Electrical Engineering Department at National University of Kaohsiung and also serves as the General Director of National Nano Device Laboratories (NDL), a leading government lab at Taiwan. He is a chair of IEEE EDS Tainan Local Chapter. He has published 5 edited books, over 100 peer reviewed papers, 3 book chapters, and over 100 patents. His recent work is focused on the field of nano-scaled FETs, SOI FET, and 3D FET.

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Cite this work

Researchers should cite this work as follows:

  • Wen-Kuan Yeh (2017), "Nano Device Laboratories - Beyond More than Moore CMOS," http://nanohub.org/resources/27743.

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Location

Burton Morgan, 129, Purdue University, West Lafayette, IN

Nano Device Laboratories - Beyond More than Moore CMOS
  • Nano Device Laboratories - Beyond More than Moore CMOS 1. Nano Device Laboratories - Bey… 0
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  • Outline 2. Outline 72.0387053720387
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  • Planar Bulk Si MOSFET reach to limit 3. Planar Bulk Si MOSFET reach to… 83.883883883883883
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  • Moore's Law - Double Density : L and W ~ 0.7x per 18 month 4. Moore's Law - Double Density :… 121.42142142142143
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  • Background in Semiconductor Study (1990-2016) 5. Background in Semiconductor St… 142.50917584250919
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  • The Transistor Revolution (1) 6. The Transistor Revolution (1) 222.18885552218887
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  • The Transistor Revolution (2) 7. The Transistor Revolution (2) 240.64064064064064
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  • FinFET 8. FinFET 282.91624958291624
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  • Gate length Litho: EB/FIB 9. Gate length Litho: EB/FIB 288.08808808808811
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  • tsmc Roadmap 10. tsmc Roadmap 305.50550550550554
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  • National Nano Device Laboratories (NDL) 1988 Founded as 11. National Nano Device Laborator… 344.61127794461129
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  • NDL's Core Facilities 12. NDL's Core Facilities 405.53887220553889
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  • NDL Labs Class 10-100 Clean Room 13. NDL Labs Class 10-100 Clean Ro… 456.99032365699031
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  • More Moore vs. More than Moore 14. More Moore vs. More than Moore 466.03269936603272
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  • Alternative Material/Structure Device 15. Alternative Material/Structure… 492.55922589255925
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  • 2D Materials Family Development Path 16. 2D Materials Family Developmen… 517.5508842175509
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  • New Material: 2D material + Fin structure 17. New Material: 2D material + Fi… 533.83383383383386
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  • Steep Slope Transistors - NC FinFET 18. Steep Slope Transistors - NC F… 558.5251918585252
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  • New Structure: Gate-all-around (GAA) FETs 19. New Structure: Gate-all-around… 584.85151818485156
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  • Device Simulation 20. Device Simulation 669.63630296963629
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  • NCFET Simulation 104 21. NCFET Simulation 104 700.23356690023354
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  • More than Moore 22. More than Moore 726.6266266266266
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  • More Than Moore 23. More Than Moore 734.76810143476814
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  • IoT Business Model 24. IoT Business Model 748.54854854854852
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  • MEMS Device Integration Platform 25. MEMS Device Integration Platfo… 772.67267267267266
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  • New Application: Power Gas Sensor Platform 26. New Application: Power Gas Sen… 780.44711378044713
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  • Self-powered PVRFID-Tag In-situ 3D-positioning 27. Self-powered PVRFID-Tag In-sit… 804.8048048048048
    00:00/00:00
  • Rapid screening detection sensor - Pathogens, Cancer 28. Rapid screening detection sens… 825.39205872539208
    00:00/00:00
  • New Integration: Monolithic 3D+IC Technology 29. New Integration: Monolithic 3D… 852.91958625291966
    00:00/00:00
  • Monolithic 3D+IC 30. Monolithic 3D+IC 887.18718718718719
    00:00/00:00
  • NDL Published at VLSI 31. NDL Published at VLSI 907.14047380714055
    00:00/00:00
  • Metrology Analysis Service 32. Metrology Analysis Service 913.98064731398063
    00:00/00:00
  • High-Frequency Measurement Capability 33. High-Frequency Measurement Cap… 927.394060727394
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  • Possible Cooperation Topic 34. Possible Cooperation Topic 939.67300633967307
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  • Welcome you to NDL ! 35. Welcome you to NDL ! 951.75175175175184
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