ME 290R: Topics in Manufacturing - Nanoscale Manipulation of Materials

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

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Abstract

Fall 2017

This graduate level course surveys sub-micrometer pattern-transfer techniques with applications in semiconductor manufacturing, data storage, photonics, and surface engineering. Lectures introduce the optical and mechanical principles underlying a spectrum of candidate lithography techniques, and show extensive examples of industrial applications.

Bio

Hayden Taylor is an Assistant Professor in the Department of Mechanical Engineering at the University of California, Berkeley. He was previously an Assistant Professor at Nanyang Technological University in Singapore, a Postdoctoral Research Fellow in the Biosystems and Micromechanics group at the Singapore-MIT Alliance for Research and Technology, and a Research Associate in the Microsystems Technology Laboratories at MIT.

Hayden was born in Bristol, United Kingdom, in 1981. He attended Bristol Grammar School and Trinity College, Cambridge, receiving the B.A. and M.Eng. degrees in Electrical and Electronic Engineering in 2004. He was sponsored as an undergraduate by ST Microelectronics. He is a Senior Scholar of Trinity College, Cambridge, and received the Cambridge University Engineering Department's Baker Prize in 2004. Hayden received the Ph.D. in Electrical Engineering and Computer Science from MIT in 2009, working with Professor Duane Boning.

Hayden is a member of the IEEE, the Institution of Engineering and Technology, and the Institute of Physics. He was an Institution of Electrical Engineers Jubilee Scholar 2000-4, and was a Kennedy Scholar for the academic year 2004-5.

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Researchers should cite this work as follows:

  • Taylor, Hayden (2019), "ME 290R: Topics in Manufacturing - Nanoscale Manipulation of Materials," http://nanohub.org/resources/30194.

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Nanoscale Manufacturing at The University of Illinois

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Lecture Number/Topic Online Lecture Video Lecture Notes Supplemental Material Suggested Exercises
ME 290R Lecture 1: Introduction View HTML
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ME 290R Lecture 2.1: Lithography Performance Criteria - Technical View HTML
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ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling) View HTML
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ME 290R Lecture 3.1: Nanoimprint Lithography - Process Mechanics I View HTML
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ME 290R Lecture 3.2: Nanoimprint Lithography - Process Mechanics II View HTML
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ME 290R Lecture 3.3: Nanoimprint Lithography - Process Mechanics III View HTML
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ME 290R Lecture 3.4: Nanoimprint Lithography - Process Mechanics IV View HTML
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ME 290R Lecture 4.1: Nanoimprint Lithography – Imprintable Materials I View HTML
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ME 290R Lecture 4.2: Nanoimprint Lithography – Imprintable Materials II View HTML
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ME 290R Lecture 5: Nanoimprint Lithography – Stamp Fabrication View HTML
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ME 290R Lecture 6.1: Nanoimprint Lithography - Machine Design I View HTML
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ME 290R Lecture 6.2: Nanoimprint Lithography – Machine Design II View HTML
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ME 290R Lecture 7.1: Nanoimprint Lithography – Applications I View HTML
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ME 290R Lecture 7.2: Nanoimprint Lithography – Applications II View HTML
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ME 290R Lecture 8: Microcontact Printing View HTML
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ME 290R Lecture 9: Lithography for MEMS and Microfluidics View HTML
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ME 290R Lecture 10.1: Photolithography I View HTML
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ME 290R Lecture 10.2: Photolithography II View HTML
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ME 290R Lecture 10.3: Photolithography III View HTML
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ME 290R Lecture 11: Extreme UV Lithography View HTML
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ME 290R Lecture 12.1: Scanning-beam Lithography and Directed Self-assembly I View HTML
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ME 290R Lecture 12.2: Scanning-beam Lithography and Directed Self-assembly II View HTML
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