Micro-Mechanics Simulation Tool: Thin film

By Sowmya Ramarapu1, Soumava Bera1, Lei Cao1, Marisol Koslowski1, Lei Lei1, Efosa Ogiesoba1, Andrew Robison, Ruixuan Ren1, Nikolaus Utomo1, Yuesong Xie1

1. Purdue University

This tool simulates a threading dislocation evolving in a passivated thin film

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Version 1.1 - published on 08 Aug 2014

doi:10.4231/D3M03XZ0K cite this

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Usage

World usage

Location of all "Micro-Mechanics Simulation Tool: Thin film" Users Since Its Posting

Simulation Users

139

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Users By Organization Type
Type Users
Educational - University 87 (62.59%)
Unidentified 47 (33.81%)
Unemployed 2 (1.44%)
Industry 2 (1.44%)
National Lab 1 (0.72%)
Users by Country of Residence
Country Users
us UNITED STATES 45 (54.88%)
in INDIA 14 (17.07%)
de GERMANY 5 (6.1%)
tw TAIWAN 4 (4.88%)
ru RUSSIAN FEDERATION 3 (3.66%)
bd BANGLADESH 3 (3.66%)
au AUSTRALIA 2 (2.44%)
tr TURKEY 2 (2.44%)
dz ALGERIA 2 (2.44%)
se SWEDEN 2 (2.44%)

Simulation Runs

560

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Overview
Average Total
Wall Clock Time 3.82 hours 47.74 days
CPU time 12.72 seconds 1.06 hours
Interaction Time 42.6 minutes 8.87 days