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ECE 612 Lecture 18B: CMOS Process Flow
Purdue University
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Abstract
For a basic, CMOS process flow for an STI (shallow trench isolation process), see: http://www.rit.edu/~lffeee/AdvCmos2003.pdf.
This lecture is a condensed version of the more complete presentation (listed above) by Dr. Fuller.
Credits
The author is indebted to Dr. Lynn Fuller of Rochester Institute of Technology for making these materials available.
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Location
EE 117, Purdue University, West Lafayette, IN