For a basic, CMOS process flow for an STI (shallow trench isolation process), see: http://www.rit.edu/~lffeee/AdvCmos2003.pdf.
This lecture is a condensed version of the more complete presentation (listed above) by Dr. Fuller.
The author is indebted to Dr. Lynn Fuller of Rochester Institute of Technology for making these materials available.
Researchers should cite this work as follows: