Illinois ME 498 Introduction of Nano Science and Technology, Lecture 27: Optical Methods

By Nick Fang1, Omar Sobh1

1. University of Illinois at Urbana-Champaign

Published on

Abstract

Optical Mathods

Topics:

  • Photomask and Reticles
  • Positive and Negative Lithography
  • Relationship between Mask and Resist
  • 8 Steps of Photolithography
  • Photolithographic Process
  • Positive Photoresists
  • Negative Photoresists
  • Chemistry of Photo-Crosslinking
  • A simplified Model of Polymerization
  • Photoresist Physical Properties
  • Resist Contrast
  • Photoresist contrast ratio
  • Resist Polarity - Exposure Energy
  • Empirical Resolution
  • Geometric Optics
  • Minimum and Critical Modulation
  • Wavefront Engineering Techniques
  • From Micro to Nano Stereolithography
  • Interference Lithography
  • 3-D Holographic Lithography
  • Near Field Optical Recording
  • Flying Head Plasmonic Nanolithography
  • Cite this work

    Researchers should cite this work as follows:

    • Nick Fang; Omar Sobh (2010), "Illinois ME 498 Introduction of Nano Science and Technology, Lecture 27: Optical Methods ," http://nanohub.org/resources/8171.

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