Nanomanufacturing 2: Optical Nanomanufacturing
Topics:
Three Basic Exposure Methods
Photomask and Reticles
Positive and Negative Lithography
Relationshil Between Mask and Resist
Eight Steps to Photolithography
Photolithographic Process
Positive Photoresists
Negative Photoresists
Chemistry of Photo-crosslinking
A simplified model of Polymerization
PhotoResist Physical Properties
Resist Contrast
Geometric Optics
Fourier Analysis on Image Transfer
Modulation Transfer Function
The Impact of MTF
Wavefront Engineering Techniques
From Micro to Nano Stereolithography
Plasmon Enhanced Lithography
Interference Lithography
3D Holographic Lithography
Researchers should cite this work as follows:
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Nick Fang (2010), "Illinois ME 498 Introduction of Nano Science and Technology, Lecture 27: Nanomanufacturing 2: Optical Nanomanufacturing," https://nanohub.org/resources/8529.
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