ABACUS: MOSFET - Diffusion Process

By Dragica Vasileska1, Gerhard Klimeck2

1. Arizona State University 2. Purdue University

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The goal of this assignment is to make familiar the students the required doses in the diffusion step of fabrication of semiconductor devices to get certain values of the volume doping densities.

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Researchers should cite this work as follows:

  • Dragica Vasileska; Gerhard Klimeck (2010), "ABACUS: MOSFET - Diffusion Process," http://nanohub.org/resources/9484.

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