Effect of Doping on Semiconductors

By Umberto Ravaioli1, Nahil Sobh1, Mohamed Mohamed1

1. University of Illinois at Urbana-Champaign

effects of doping in bulk silicon.

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Version 1.0a - published on 04 Sep 2014

doi:10.4231/D3VQ2SB59 cite this

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Usage

World usage

Location of all "Effect of Doping on Semiconductors" Users Since Its Posting

Simulation Users

1,518

9 21 35 37 47 111 120 127 129 135 139 152 172 185 196 199 206 218 234 243 250 256 269 274 291 299 340 352 363 410 420 465 517 527 536 550 563 582 621 630 646 741 761 779 787 797 802 808 819 826 835 843 851 927 1,002 1,010 1,023 1,036 1,048 1,056 1,072 1,086 1,098 1,107 1,126 1,278 1,287 1,299 1,301 1,307 1,310 1,312 1,322 1,331 1,334 1,338 1,364 1,435 1,438 1,448 1,454 1,462 1,466 1,469 1,483 1,490 1,495 1,499 1,503 1,506 1,511 1,516 1,518

Users By Organization Type
Type Users
Educational - University 960 (63.2%)
Unidentified 493 (32.46%)
Industry 28 (1.84%)
National Lab 18 (1.18%)
Unemployed 8 (0.53%)
Educational - Pre-College 4 (0.26%)
Government Agency 4 (0.26%)
Military 4 (0.26%)
Users by Country of Residence
Country Users
us UNITED STATES 334 (39.06%)
pk PAKISTAN 233 (27.25%)
in INDIA 154 (18.01%)
tr TURKEY 38 (4.44%)
de GERMANY 23 (2.69%)
tw TAIWAN 18 (2.11%)
it ITALY 15 (1.75%)
cn CHINA 15 (1.75%)
kr KOREA, REPUBLIC OF 14 (1.64%)
gb UNITED KINGDOM 11 (1.29%)

Simulation Runs

4,572

30 58 82 85 99 303 336 350 358 366 374 398 435 466 483 489 499 518 542 560 569 576 597 604 639 653 722 740 762 846 869 977 1169 1183 1200 1224 1255 1280 1380 1395 1430 1606 1680 1766 1793 1814 1823 1837 1862 1874 1890 1910 1932 2196 2588 2630 2676 2710 2743 2769 2776 2808 2840 2866 2958 3541 3585 3657 3665 3684 3698 3708 3738 3772 3788 3798 3880 4256 4316 4358 4378 4414 4422 4428 4478 4494 4508 4516 4526 4532 4556 4568 4572
Overview
Average Total
Wall Clock Time 19.25 hours 1119.52 days
CPU time 48.33 seconds 18.74 hours
Interaction Time 1.18 hours 68.36 days