Micro-Mechanics Simulation Tool: Thin film

By Sowmya Ramarapu1, Soumava Bera1, Lei Cao1, Marisol Koslowski1, Lei Lei1, Efosa Ogiesoba1, Andrew Robison, Ruixuan Ren1, Nikolaus Utomo1, Yuesong Xie1

1. Purdue University

This tool simulates a threading dislocation evolving in a passivated thin film

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Version 1.1 - published on 08 Aug 2014

doi:10.4231/D3M03XZ0K cite this

This tool is closed source.

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Usage

World usage

Location of all "Micro-Mechanics Simulation Tool: Thin film" Users Since Its Posting

Simulation Users

107

9 10 10 16 20 21 21 23 24 24 25 28 30 30 32 34 35 38 40 42 43 43 47 48 48 48 52 53 55 56 56 59 59 59 63 63 66 68 68 70 71 72 72 72 74 75 78 78 80 82 82 82 83 83 84 84 84 85 87 88 90 92 93 93 93 93 93 94 95 95 96 97 99 100 102 102 102 103 104 104 105 107 107

Users By Organization Type
Type Users
Educational - University 83 (77.57%)
Unidentified 19 (17.76%)
Industry 2 (1.87%)
Unemployed 2 (1.87%)
National Lab 1 (0.93%)
Users by Country of Residence
Country Users
us UNITED STATES 43 (54.43%)
in INDIA 14 (17.72%)
de GERMANY 5 (6.33%)
tw TAIWAN 4 (5.06%)
bd BANGLADESH 3 (3.8%)
pl POLAND 2 (2.53%)
au AUSTRALIA 2 (2.53%)
tr TURKEY 2 (2.53%)
dz ALGERIA 2 (2.53%)
se SWEDEN 2 (2.53%)

Simulation Runs

425

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Overview
Average Total
Wall Clock Time 4.87 hours 44.4 days
CPU time 13.51 seconds 49.3 minutes
Interaction Time 53.03 minutes 8.07 days