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Micro-Mechanics Simulation Tool: Thin film

By Sowmya Ramarapu1, Soumava Bera1, Lei Cao1, Marisol Koslowski1, Lei Lei1, Efosa Ogiesoba1, Andrew Robison, Ruixuan Ren1, Nikolaus Utomo1, Yuesong Xie1

1. Purdue University

This tool simulates a threading dislocation evolving in a passivated thin film

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Version 1.1 - published on 08 Aug 2014

doi:10.4231/D3M03XZ0K cite this

This tool is closed source.

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Usage

World usage

Location of all "Micro-Mechanics Simulation Tool: Thin film" Users Since Its Posting

Simulation Users

98

9 10 10 16 20 21 21 23 24 24 25 28 30 30 32 34 35 38 40 42 43 43 47 48 48 48 52 53 55 56 56 59 59 59 63 63 66 68 68 70 71 72 72 72 74 75 78 78 80 82 82 82 83 83 84 84 84 85 87 88 90 92 93 94 94 94 94 95 95 95 96 97 98

Users By Organization Type
Type Users
Educational - University 82 (83.67%)
Unidentified 11 (11.22%)
Unemployed 2 (2.04%)
Industry 2 (2.04%)
National Lab 1 (1.02%)
Users by Country of Residence
Country Users
us UNITED STATES 42 (53.85%)
in INDIA 14 (17.95%)
de GERMANY 5 (6.41%)
tw TAIWAN 4 (5.13%)
bd BANGLADESH 3 (3.85%)
au AUSTRALIA 2 (2.56%)
tr TURKEY 2 (2.56%)
dz ALGERIA 2 (2.56%)
se SWEDEN 2 (2.56%)
pl POLAND 2 (2.56%)

Simulation Runs

400

65 71 73 87 99 101 101 104 105 105 109 114 121 121 125 136 139 155 161 163 167 171 185 188 188 188 194 197 210 211 211 218 220 220 238 255 283 287 289 292 294 300 300 302 309 310 321 321 326 332 334 334 337 337 338 339 339 341 354 406 417 449 453 454 456 461 461 469 394 395 398 399 400
Overview
Average Total
Wall Clock Time 5.13 hours 44.29 days
CPU time 13.86 seconds 47.82 minutes
Interaction Time 55.49 minutes 7.98 days

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