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Illinois Tools: Nanofilm Lab

By Nahil Sobh1, Zuhaib Bashir Sheikh1

1. University of Illinois at Urbana-Champaign

Interaction of electromagnetic plane wave and nanoscale metallic film with subwavelength slit

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Version 1.2a - published on 13 Aug 2014

doi:10.4231/D3125Q98M cite this

Open source: license | download

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Usage

World usage

Location of all "Illinois Tools: Nanofilm Lab" Users Since Its Posting

Simulation Users

73

14 17 19 19 22 22 26 27 30 32 32 36 38 39 39 40 41 41 43 44 45 45 48 51 54 56 57 60 60 61 62 62 65 67 69 70 70 70 72 72 73

Users By Organization Type
Type Users
Educational - University 57 (78.08%)
Unidentified 12 (16.44%)
Educational - Pre-College 2 (2.74%)
National Lab 1 (1.37%)
Unemployed 1 (1.37%)
Users by Country of Residence
Country Users
us UNITED STATES 27 (55.1%)
in INDIA 6 (12.24%)
cn CHINA 4 (8.16%)
ro ROMANIA 2 (4.08%)
kr KOREA, REPUBLIC OF 2 (4.08%)
dz ALGERIA 2 (4.08%)
ca CANADA 2 (4.08%)
it ITALY 2 (4.08%)
nl NETHERLANDS 1 (2.04%)
es SPAIN 1 (2.04%)

Simulation Runs

291

81 104 110 110 119 119 131 152 161 164 175 184 194 195 195 200 205 205 208 211 214 214 218 245 252 255 256 261 261 263 269 269 275 277 281 283 283 283 288 290 291
Overview
Average Total
Wall Clock Time 3 hours 19.77 days
CPU time 1.02 minutes 2.68 hours
Interaction Time 2.19 hours 14.44 days

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