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Process Lab : Defect-coupled diffusion

By Shuqing (Victor) Cao, Yang Liu, Peter Griffin

Stanford University

Integrated Circuit Fabrication Process Simulation : Simulates dopant diffusion coupled with point defects

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Version 1 - published on 26 Sep 2006

doi:10254/nanohub-r1882.1 cite this

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212 How to change the initial substrate concentration?
Asked by Marek Sosnowski @ 02:23 PM on 10 Feb 2009 • Open • 0

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