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Process Lab : Defect-coupled diffusion

By Shuqing (Victor) Cao, Yang Liu, Peter Griffin

Stanford University

Integrated Circuit Fabrication Process Simulation : Simulates dopant diffusion coupled with point defects

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Version 1 - published on 26 Sep 2006

doi:10254/nanohub-r1882.1 cite this

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Usage

Table 1: Overview
Item Average Total
Simulation Users: - 213
Interactive Sessions: - 435
Simulation Sessions: - 1,242
Simulation Runs: - 1,670
Wall Clock Time: 1.09 hours 56.31 days
CPU time: 2.38 seconds 49.22 minutes
Interaction Time: 28.03 minutes 24.18 days

Table 2: Users By Organization Type
# Type Users Percent
1 Educational - University 168 78.87
2 Unidentified 19 8.92
3 Industry 16 7.51
4 National Lab 6 2.82
5 Educational - Pre-College 3 1.41
6 Unemployed 2 0.94
7 Military 1 0.47
8 Government Agency 1 0.47
Total Users 213 100
Table 3: Users by Country of Residence
# Country Users Percent
1 UNITED STATES 135 63.38
2 TAIWAN 10 4.69
3 INDIA 7 3.29
4 PAKISTAN 4 1.88
5 GERMANY 4 1.88
6 KOREA, REPUBLIC OF 3 1.41
7 MACEDONIA, THE FORMER YUGOSLAV REPUBLIC OF 3 1.41
8 SWEDEN 3 1.41
9 FRANCE 2 0.94
10 SWITZERLAND 2 0.94
Total Users 213 100
Table 4: Top Domains by User Count
# Domains Users Percent
1 stanford.edu 53 24.88
2 Unidentified 31 14.55
3 comcast.net 13 6.1
4 pacbell.net 8 3.76
5 ohio-state.edu 7 3.29
6 rr.com 6 2.82
7 purdue.edu 5 2.35
8 insightbb.com 5 2.35
9 neduet.edu.pk 4 1.88
10 nctu.edu.tw 4 1.88
Total Users 213 100

Location of all "Process Lab : Defect-coupled diffusion" Users Since Its Posting

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