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58 users in 3 class(es)

Process Lab : Defect-coupled diffusion

Stanford University

Integrated Circuit Fabrication Process Simulation : Simulates dopant diffusion coupled with point defects

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Version 1 - published on 26 Sep 2006

doi:10254/nanohub-r1882.1 cite this

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Table 2: Users By Organization Type
#	Type	Users	Percent
1	Educational - University	168	78.87
2	Unidentified	19	8.92
3	Industry	16	7.51
4	National Lab	6	2.82
5	Educational - Pre-College	3	1.41
6	Unemployed	2	0.94
7	Military	1	0.47
8	Government Agency	1	0.47
	Total Users	213	100

Table 3: Users by Country of Residence
#	Country	Users	Percent
1	UNITED STATES	135	63.38
2	TAIWAN	10	4.69
3	INDIA	7	3.29
4	PAKISTAN	4	1.88
5	GERMANY	4	1.88
6	KOREA, REPUBLIC OF	3	1.41
7	MACEDONIA, THE FORMER YUGOSLAV REPUBLIC OF	3	1.41
8	SWEDEN	3	1.41
9	FRANCE	2	0.94
10	SWITZERLAND	2	0.94
	Total Users	213	100

Table 4: Top Domains by User Count
#	Domains	Users	Percent
1	stanford.edu	53	24.88
2	Unidentified	31	14.55
3	comcast.net	13	6.1
4	pacbell.net	8	3.76
5	ohio-state.edu	7	3.29
6	rr.com	6	2.82
7	purdue.edu	5	2.35
8	insightbb.com	5	2.35
9	neduet.edu.pk	4	1.88
10	nctu.edu.tw	4	1.88
	Total Users	213	100

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