Support

Support Options

Submit a Support Ticket

 
Home › Resources › Tools › Process Lab : Defect-coupled diffusion › Usage
This resource has a 8.7 Ranking

Ranking is calculated from a formula comprised of user reviews and usage statistics. Learn more ›

Usage Stats
Total: updated 22 May 2013
Users: 235
Jobs: 1963
Avg. exec. time: 2 secs
Reviews & Citations
Google/IEEE: updated 22 Apr 2010
Avg. Review: 3.0 out of 5 stars
Citations: 3
  •  
  •  
  •  
  •  
  •  
  • Intermediate-Advanced
Difficulty Level Target Audience
  •  
  •  
  •  
  •  
  •  
 K-12 Middle/High School
  •  
  •  
  •  
  •  
  •  
 Easy Freshmen/Sophomores
  •  
  •  
  •  
  •  
  •  
 Intermediate Juniors/Seniors
  •  
  •  
  •  
  •  
  •  
 Advanced Graduate Students
  •  
  •  
  •  
  •  
  •  
 Expert PhD Experts

Learn more ›

235 users, detailed usage

62 users in 5 classes

1 Citation(s)

1 question (Ask a question)

1 review(s) (Review this)

0 wish(es) (Add a new wish)

Process Lab : Defect-coupled diffusion

By Shuqing (Victor) Cao1, Yang Liu1, Peter Griffin1

1. Stanford University

Integrated Circuit Fabrication Process Simulation : Simulates dopant diffusion coupled with point defects

Launch Tool

You must login before you can run this tool.

Version 1 - published on 26 Sep 2006

doi:10.4231/D3XW47V8Z cite this

This tool is closed source.

View All Supporting Documents

Usage

World usage

Location of all "Process Lab : Defect-coupled diffusion" Users Since Its Posting

Simulation Users

235

7 13 56 60 67 71 75 79 82 87 92 96 100 102 124 125 125 126 131 136 138 138 139 139 140 140 141 142 146 149 150 150 150 152 154 154 155 156 156 156 156 157 160 160 169 170 172 172 173 173 173 174 177 179 183 184 185 185 185 186 188 193 200 200 202 206 209 213 215 216 219 219 221 230 232 233 233 233 235 235 235

Users By Organization Type
Type Users
Educational - University 186 (79.15%)
Industry 22 (9.36%)
Unidentified 14 (5.96%)
National Lab 6 (2.55%)
Educational - Pre-College 3 (1.28%)
Unemployed 2 (0.85%)
Government Agency 1 (0.43%)
Military 1 (0.43%)
Users by Country of Residence
Country Users
us UNITED STATES 146 (74.87%)
tw TAIWAN 10 (5.13%)
in INDIA 8 (4.1%)
pk PAKISTAN 8 (4.1%)
kr KOREA, REPUBLIC OF 5 (2.56%)
de GERMANY 5 (2.56%)
mk MACEDONIA, THE FORMER YUGOSLAV REPUBLIC OF 5 (2.56%)
se SWEDEN 3 (1.54%)
fr FRANCE 3 (1.54%)
pl POLAND 2 (1.03%)

Simulation Runs

1,963

54 297 748 756 771 792 802 807 814 821 829 838 843 849 1121 1123 1123 1125 1136 1145 1154 1154 1155 1155 1159 1159 1161 1163 1174 1234 1239 1239 1239 1244 1248 1248 1251 1253 1253 1253 1259 1264 1270 1270 1362 1440 1444 1444 1450 1450 1450 1456 1466 1476 1508 1510 1511 1511 1511 1517 1521 1540 1633 1633 1636 1647 1653 1670 1680 1686 1714 1726 1751 1797 1816 1915 1920 1920 1960 1960 1963
Overview
Average Total
Wall Clock Time 59.87 minutes 60.86 days
CPU time 2.27 seconds 55.35 minutes
Interaction Time 26.1 minutes 26.54 days

Get Help

Get Involved

Legal

nanoHUB.org, a resource for nanoscience and nanotechnology, is supported by the National Science Foundation and other funding agencies.