Support Options

Submit a Support Ticket


Process Lab : Defect-coupled diffusion

By Shuqing (Victor) Cao1, Yang Liu1, Peter Griffin1

1. Stanford University

Integrated Circuit Fabrication Process Simulation : Simulates dopant diffusion coupled with point defects

Launch Tool

You must login before you can run this tool.

Version 1 - published on 26 Sep 2006

doi:10.4231/D3XW47V8Z cite this

This tool is closed source.

View All Supporting Documents, a resource for nanoscience and nanotechnology, is supported by the National Science Foundation and other funding agencies. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.