Support

Support Options

Submit a Support Ticket

 
HomeResourcesToolsProcess Lab:Oxidation › Usage

Process Lab:Oxidation

By Shuqing (Victor) Cao, Yang Liu, Peter Griffin

Stanford University

Integrated Circuit Fabrication Process Simulation

Launch Tool

You must login before you can run this tool.

Version 1.0 - published on 14 Sep 2006

doi:10254/nanohub-r1879.1 cite this

This tool is closed source.

View All Supporting Documents

Usage

Table 1: Overview
Item Average Total
Simulation Users: - 628
Interactive Sessions: - 2,557
Simulation Sessions: - 16,335
Simulation Runs: - 18,866
Wall Clock Time: 31.69 minutes 359.45 days
CPU time: 0.33 seconds 1.5 hours
Interaction Time: 15.5 minutes 175.86 days

Table 2: Users By Organization Type
# Type Users Percent
1 Educational - University 495 78.82
2 Industry 62 9.87
3 Unidentified 53 8.44
4 National Lab 15 2.39
5 Unemployed 4 0.64
6 Government Agency 4 0.64
7 Educational - Pre-College 3 0.48
8 Military 1 0.16
Total Users 628 100
Table 3: Users by Country of Residence
# Country Users Percent
1 UNITED STATES 422 67.2
2 INDIA 30 4.78
3 GERMANY 13 2.07
4 KOREA, REPUBLIC OF 12 1.91
5 FRANCE 10 1.59
6 TAIWAN 10 1.59
7 PAKISTAN 9 1.43
8 UNITED KINGDOM 8 1.27
9 CANADA 8 1.27
10 BELGIUM 7 1.11
Total Users 628 100
Table 4: Top Domains by User Count
# Domains Users Percent
1 stanford.edu 163 25.96
2 Unidentified 102 16.24
3 comcast.net 46 7.32
4 vt.edu 24 3.82
5 cvtc.edu 22 3.5
6 njit.edu 21 3.34
7 rr.com 19 3.03
8 purdue.edu 17 2.71
9 sbcglobal.net 13 2.07
10 shentel.net 12 1.91
Total Users 628 100

Location of all "Process Lab:Oxidation" Users Since Its Posting

Map

nanoHUB.org, a resource for nanoscience and nanotechnology, is supported by the National Science Foundation and other funding agencies.