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Process Lab:Oxidation

By Shuqing (Victor) Cao1, Yang Liu1, Peter Griffin1

1. Stanford University

Integrated Circuit Fabrication Process Simulation

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Version 1.01 - published on 22 Aug 2014

doi:10.4231/D3FT8DK6Z cite this

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Usage

World usage

Location of all "Process Lab:Oxidation" Users Since Its Posting

Simulation Users

770

11 122 127 144 169 214 221 228 237 248 256 265 292 376 383 388 394 401 410 416 418 420 428 435 438 442 446 447 461 479 482 484 485 489 489 490 491 493 495 499 514 516 518 520 526 529 529 529 530 531 535 537 539 546 549 559 572 573 577 581 583 593 602 605 608 620 621 629 637 646 646 646 661 684 685 687 688 699 700 728 732 732 732 732 733 736 737 738 739 741 744 748 762 768 769 770

Users By Organization Type
Type Users
Educational - University 590 (76.62%)
Unidentified 80 (10.39%)
Industry 65 (8.44%)
National Lab 18 (2.34%)
Educational - Pre-College 5 (0.65%)
Government Agency 5 (0.65%)
Unemployed 5 (0.65%)
Educational - Unspec. Level 1 (0.13%)
Military 1 (0.13%)
Users by Country of Residence
Country Users
us UNITED STATES 473 (77.29%)
in INDIA 36 (5.88%)
kr KOREA, REPUBLIC OF 24 (3.92%)
de GERMANY 16 (2.61%)
pk PAKISTAN 15 (2.45%)
fr FRANCE 14 (2.29%)
tw TAIWAN 10 (1.63%)
ca CANADA 9 (1.47%)
gb UNITED KINGDOM 8 (1.31%)
be BELGIUM 7 (1.14%)

Simulation Runs

22,347

161 8522 8684 8789 8875 9340 9378 9433 9476 9513 9528 9557 9936 14930 15047 15113 15133 15286 15333 15385 15400 15444 15560 15587 15601 15648 15712 15717 15981 16210 16257 16287 16290 16301 16302 16314 16321 16327 16332 16358 16582 16609 16620 16648 16708 16771 16771 16771 16777 16783 16798 16837 16874 16928 16982 17066 17826 17841 17863 17893 17909 18001 18128 18161 18229 18695 18722 18904 19078 19200 19209 19212 19316 19775 19810 19834 19838 20132 20140 21057 21449 21449 21458 21460 21464 21507 21508 21518 21519 21528 21601 21664 22279 22332 22346 22347
Overview
Average Total
Wall Clock Time 34.53 minutes 462.33 days
CPU time 0.38 seconds 2.02 hours
Interaction Time 18.11 minutes 242.42 days

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