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Process Lab : Oxidation Flux

By Shuqing (Victor) Cao, Yang Liu, Peter Griffin

Stanford University

Integrated Circuit Fabrication Process Simulation : Oxidation Flux

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Version 1 - published on 22 Sep 2006

doi:10254/nanohub-r1880.1 cite this

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Usage

Table 1: Overview
Item Average Total
Simulation Users: - 276
Interactive Sessions: - 566
Simulation Sessions: - 1,829
Simulation Runs: - 2,392
Wall Clock Time: 1.35 hours 102.59 days
CPU time: 0.34 seconds 10.23 minutes
Interaction Time: 49.42 minutes 62.77 days

Table 2: Users By Organization Type
# Type Users Percent
1 Educational - University 234 84.78
2 Industry 27 9.78
3 Unidentified 10 3.62
4 National Lab 4 1.45
5 Government Agency 3 1.09
6 Educational - Pre-College 1 0.36
Total Users 276 100
Table 3: Users by Country of Residence
# Country Users Percent
1 UNITED STATES 221 80.07
2 INDIA 5 1.81
3 UNITED KINGDOM 3 1.09
4 PAKISTAN 3 1.09
5 CANADA 3 1.09
6 FRANCE 3 1.09
7 SWEDEN 3 1.09
8 GERMANY 3 1.09
9 AUSTRALIA 2 0.72
10 IRELAND 2 0.72
Total Users 276 100
Table 4: Top Domains by User Count
# Domains Users Percent
1 stanford.edu 144 52.17
2 Unidentified 26 9.42
3 comcast.net 20 7.25
4 pacbell.net 8 2.9
5 sbcglobal.net 8 2.9
6 purdue.edu 7 2.54
7 neduet.edu.pk 3 1.09
8 rcac.purdue.edu 2 0.72
9 ufl.edu 2 0.72
10 proxad.net 2 0.72
Total Users 276 100

Location of all "Process Lab : Oxidation Flux" Users Since Its Posting

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