Tags: AMC12

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  1. [Illinois] Advanced Materials Characterization Workshop 2012: Recent Developments in a Novel Dynamical Testing Technique

    05 Jul 2012 | | Contributor(s):: Jeffrey Schirer

    Nanomechanical testing, often nanoindentation, has been well-established at a basic level for characterization of small volumes of material and low-dimensional structures, with the size scale of the applications dictating the physical testing size scale required. The aspiration to understand...

  2. [Illinois] Advanced Materials Characterization Workshop 2012: Technical Requirements For Successful Tip Enhanced Raman (TERS) Imaging: Towards Label-Free Chemical Imaging At The Nano-scale

    05 Jul 2012 | | Contributor(s):: Emmanuel Leroy

    Since the mid 1980’s, Scanning Probe Microscopy has been a catalyst for research on nanotechnologies,making the study of nano-materials affordable, and has greatly enhanced the analysis of mechanical andelectrical properties of those materials, yet it has limited chemical specificity.Raman...

  3. [Illinois] Advanced Materials Characterization Workshop 2012: AM-FM and Loss Tangent Imaging, Two Tools for Quant. Nanomechanical Property Mapping

    05 Jul 2012 | | Contributor(s):: Irene Revenko

    Amplitude-modulated Atomic Force Microscopy (AM-AFM), also known as tapping mode, is a proven, reliable and gentle imaging method with wide spread applications. Previously, the contrast in AM-AFM has been difficult to quantify. In this work, we introduce two new techniques that allow unambiguous...

  4. [Illinois] Advanced Materials Characterization Workshop 2012: Advanced AFM-Raman Setup - Towards The Spatial and Spectroscopic Resolution At Single Molecule Level

    05 Jul 2012 | | Contributor(s):: Alexey Temiryazev

    Significant advances in Scanning Probe Microscopy (SPM) during the last decade have allowed true molecular resolution in vacuum, liquid and ambient conditions. The next step in the development of this technology is to make molecular resolution imaging a reliably attainable by...

  5. [Illinois] Advanced Materials Characterization Workshop 2012: Tutorial 3: X-ray Electron Spectroscopy / Auger Electron Spectroscopy

    05 Jul 2012 | | Contributor(s):: Rick Haasch

    This workshop provides a critical, comparative and condensed overview of mainstream analytical techniques for materials characterization with emphasis on practical applications. The workshop will cover the following techniques:Atomic force microscopy (AFM)X-ray diffraction, reflectivity and...

  6. [Illinois] Advanced Materials Characterization Workshop 2012: Tutorial 4: X-ray Diffraction and Reflectometry

    05 Jul 2012 | | Contributor(s):: Mauro Sardela

    This workshop provides a critical, comparative and condensed overview of mainstream analytical techniques for materials characterization with emphasis on practical applications. The workshop will cover the following techniques:Atomic force microscopy (AFM)X-ray diffraction, reflectivity and...

  7. [Illinois] Advanced Materials Characterization Workshop 2012: The Schmidt-Czerny-Turner Spectrograph

    05 Jul 2012 | | Contributor(s):: Jason McClure

    The Czerny-Turner type imaging spectrograph is by far the most commonly usedresearch instrument in dispersive optical spectroscopy. Image aberrations inherent inthis type spectrograph impart distortions to recorded spectra that affect resolution bothspatially and spectrally. Understanding the...

  8. [Illinois] Advanced Materials Characterization Workshop 2012: Tutorial 5: Secondary Ion Mass Spectrometry/Rutherford Backscattering

    05 Jul 2012 | | Contributor(s):: Timothy P. Spila

    Secondary ion mass spectrometry is an analytical technique based on the measurement of themass of ions ejected from a solid surface after the surface has been bombarded with high energy (1-25 keV) primary ions.

  9. [Illinois] Advanced Materials Characterization Workshop 2012: Nanofabrication of Plasmonic Devices in the Helium Ion Microscope

    05 Jul 2012 | | Contributor(s):: Larry Scipioni

    Helium ion microscopy (HIM) is being used both to create and to inspect nanostructures for photonic and plasmonic devices. As part of a program exploring photoelectrons as sources for multiple beam electron beam lithography, fractal apertures are being developed to generate a sub-20nm light...