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Tags: atomic layer deposition

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  1. Chemical Equation for TDMAT ALD Formation of TiN?

    Closed | Responses: 0

    What is the chemical equation for the formation of Titanium Nitride in an ALD system using TDMAT?

    http://nanohub.org/answers/question/1356

  2. [Illinois] AVS Meeting 2012: Understanding Atomic-Layer-Deposition Synthesis of Cu 2 ZnSnS 4 Solar Cells

    04 Jun 2013 | Online Presentations | Contributor(s): Sergey V. Baryshev

    Cu2ZnSnS4 (CZTS) has recently attracted attention as a light absorber for photovoltaic applications because of its band gap (εg≈1.4 eV), the relative abundance and low cost of its constituent...

    http://nanohub.org/resources/18253

  3. Chemically Enhanced Carbon-Based Nanomaterials and Devices

    09 Nov 2010 | Online Presentations | Contributor(s): Mark Hersam

    Carbon-based nanomaterials have attracted significant attention due to their potential to enable and/or improve applications such as transistors, transparent conductors, solar cells, batteries,...

    http://nanohub.org/resources/9929

  4. MSE 376 Lecture 1: Film Deposition Methods

    04 Oct 2006 | Online Presentations | Contributor(s): Mark Hersam

    http://nanohub.org/resources/1872

  5. Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)

    13 Feb 2006 | Online Presentations | Contributor(s): Peide "Peter" Ye

    Atomic layer deposition (ALD) is an emerging nanotechnology enables the deposit of ultrathin films, one atomic layer by one atomic layer. ALD provides a powerful, new capability to grow or regrow...

    http://nanohub.org/resources/1015

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