Tags: atomic layer deposition

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  1. Design, Fabrication, and Characterization of 3D Hollow Ceramic Nano-Architectures

    06 Dec 2018 | | Contributor(s):: Dongchan Jang

    In this work, we present a new design criterion capable of significantly abating strength degradation in lightweight materials, by successfully combining size-induced strengthening effect in nanomaterials with architectural design of cellular porous materials. Hollow-tube-based 3D ceramic...

  2. Franklin Uriel Parás Hernández

    Age: 35 years old. Male,Majored in Mechanical Engineering and graduated from Tec of Monterrey at the age of 24. Got into the Graduate School of Tec of Monterrey and got a Masters degree in Thermal...

    http://nanohub.org/members/180004

  3. Lab Exercise: Atomic Layer Deposition

    13 Jan 2017 | | Contributor(s):: NACK Network

    The objective of this lab is to evaluate the atomic layer deposition (ALD) process. The ALD process will be used to deposit a transparent conducting oxide (TCO). Principles of resistance and resistivity will also be discussed.

  4. Chemical Equation for TDMAT ALD Formation of TiN?

    Closed | Responses: 0

    What is the chemical equation for the formation of Titanium Nitride in an ALD system using TDMAT?

    http://nanohub.org/answers/question/1356

  5. [Illinois] AVS Meeting 2012: Understanding Atomic-Layer-Deposition Synthesis of Cu 2 ZnSnS 4 Solar Cells

    04 Jun 2013 | | Contributor(s):: Sergey V. Baryshev

    Cu2ZnSnS4 (CZTS) has recently attracted attention as a light absorber for photovoltaic applications because of its band gap (εg≈1.4 eV), the relative abundance and low cost of its constituent elements (which permits large-scale low-cost module production), and its demonstrated...

  6. Chemically Enhanced Carbon-Based Nanomaterials and Devices

    09 Nov 2010 | | Contributor(s):: Mark Hersam

    Carbon-based nanomaterials have attracted significant attention due to their potential to enable and/or improve applications such as transistors, transparent conductors, solar cells, batteries, and biosensors. This talk will delineate chemical strategies for enhancing the electronic and optical...

  7. MSE 376 Lecture 1: Film Deposition Methods

    04 Oct 2006 |

  8. Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)

    13 Feb 2006 | | Contributor(s):: peide ye

    Atomic layer deposition (ALD) is an emerging nanotechnology enables the deposit of ultrathin films, one atomic layer by one atomic layer. ALD provides a powerful, new capability to grow or regrow nanoscale ultrathin films of metals, semiconductors and insulators. This presentation introduces ALD...