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Chemical Equation for TDMAT ALD Formation of TiN?
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What is the chemical equation for the formation of Titanium Nitride in an ALD system using TDMAT?
Chemically Enhanced Carbon-Based Nanomaterials and Devices
09 Nov 2010 | Online Presentations | Contributor(s): Mark Hersam
Carbon-based nanomaterials have attracted significant attention due to their potential to enable and/or improve applications such as transistors, transparent conductors, solar cells, batteries,...
Lab Exercise: Atomic Layer Deposition
13 Jan 2017 | Teaching Materials | Contributor(s): NACK Network
The objective of this lab is to evaluate the atomic layer deposition (ALD) process. The ALD process will be used to deposit a transparent conducting oxide (TCO). Principles of resistance and...
Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)
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13 Feb 2006 | Online Presentations | Contributor(s): peide ye
Atomic layer deposition (ALD) is an emerging nanotechnology enables the deposit of ultrathin films, one atomic layer by one atomic layer. ALD provides a powerful, new capability to grow or regrow...
MSE 376 Lecture 1: Film Deposition Methods
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04 Oct 2006 | Online Presentations | Contributor(s): Mark Hersam
[Illinois] AVS Meeting 2012: Understanding Atomic-Layer-Deposition Synthesis of Cu 2 ZnSnS 4 Solar Cells
04 Jun 2013 | Online Presentations | Contributor(s): Sergey V. Baryshev
Cu2ZnSnS4 (CZTS) has recently attracted attention as a light absorber for photovoltaic applications because of its band gap (εg≈1.4 eV), the relative abundance and low cost of its constituent...