Tags: atomic layer deposition (ALD)

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  1. 25 Linearity by Synthesis: An Intrinsically Linear AlGaN/GaN-on-Si Transistor with OIP3/(F-1)PDC of 10.1 at 30 GHz

    21 Sep 2020 | | Contributor(s):: Woojin Choi, Venkatesh Balasubramanian, Peter M. Asbeck, Shadi Dayeh

    The concept of an intrinsically synthesizable linear device is demonstrated. It was implemented by changing only the device layout; additional performance gains can be attained by further materials engineering.

  2. Chemical Equation for TDMAT ALD Formation of TiN?

    Q&A|Closed | Responses: 0

    What is the chemical equation for the formation of Titanium Nitride in an ALD system using TDMAT?

    https://nanohub.org/answers/question/1356

  3. Chemically Enhanced Carbon-Based Nanomaterials and Devices

    09 Nov 2010 | | Contributor(s):: Mark Hersam

    Carbon-based nanomaterials have attracted significant attention due to their potential to enable and/or improve applications such as transistors, transparent conductors, solar cells, batteries, and biosensors. This talk will delineate chemical strategies for enhancing the electronic and optical...

  4. Design, Fabrication, and Characterization of 3D Hollow Ceramic Nano-Architectures

    06 Dec 2018 | | Contributor(s):: Dongchan Jang

    In this work, we present a new design criterion capable of significantly abating strength degradation in lightweight materials, by successfully combining size-induced strengthening effect in nanomaterials with architectural design of cellular porous materials. Hollow-tube-based 3D ceramic...

  5. Franklin Uriel Parás Hernández

    Age: 35 years old. Male,Majored in Mechanical Engineering and graduated from Tec of Monterrey at the age of 24. Got into the Graduate School of Tec of Monterrey and got a Masters degree in Thermal...

    https://nanohub.org/members/180004

  6. Fundamental Properties of a New van der Waals Material: Tellurium

    01 Apr 2021 | | Contributor(s):: Peide "Peter" Ye

    We report the first experimental observation of Weyl fermions in a semiconductor -- high-quality n-type tellurene (the two-dimensional form of tellurium) achieved by atomic layer deposited dielectric doping.

  7. Ion Implantation, Thermal Oxidation and Atomic Layer Deposition

    07 Oct 2022 | | Contributor(s):: Atilla Ozgur Cakmak, Rich Hill, NACK Network

  8. Lab Exercise: Atomic Layer Deposition

    13 Jan 2017 | | Contributor(s):: NACK Network

    The objective of this lab is to evaluate the atomic layer deposition (ALD) process. The ALD process will be used to deposit a transparent conducting oxide (TCO). Principles of resistance and resistivity will also be discussed.

  9. Mahdi Parvaneh

    https://nanohub.org/members/181165

  10. Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)

    13 Feb 2006 | | Contributor(s):: peide ye

    Atomic layer deposition (ALD) is an emerging nanotechnology enables the deposit of ultrathin films, one atomic layer by one atomic layer. ALD provides a powerful, new capability to grow or regrow nanoscale ultrathin films of metals, semiconductors and insulators. This presentation introduces ALD...

  11. Moore’s Law Extension and Beyond

    16 Nov 2018 | | Contributor(s):: Peide "Peter" Ye

    In his talk, Ye will review his research efforts at Purdue on materials, structures and device architecture to support the microelectronic industry and extend Moore’s Law. The goal of the research is that it will lead to smarter, ubiquitous computing technology and keep us healthier,...

  12. MSE 376 Lecture 1: Film Deposition Methods

    04 Oct 2006 | | Contributor(s):: Mark C. Hersam

  13. [Illinois] AVS Meeting 2012: Understanding Atomic-Layer-Deposition Synthesis of Cu 2 ZnSnS 4 Solar Cells

    03 Jun 2013 | | Contributor(s):: Sergey V. Baryshev

    Cu2ZnSnS4 (CZTS) has recently attracted attention as a light absorber for photovoltaic applications because of its band gap (εg≈1.4 eV), the relative abundance and low cost of its constituent elements (which permits large-scale low-cost module production), and its demonstrated...