Tags: atomic layer deposition

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  1. Chemical Equation for TDMAT ALD Formation of TiN?

    Closed | Responses: 0

    What is the chemical equation for the formation of Titanium Nitride in an ALD system using TDMAT?

    http://nanohub.org/answers/question/1356

  2. Chemically Enhanced Carbon-Based Nanomaterials and Devices

    09 Nov 2010 | | Contributor(s):: Mark Hersam

    Carbon-based nanomaterials have attracted significant attention due to their potential to enable and/or improve applications such as transistors, transparent conductors, solar cells, batteries, and biosensors. This talk will delineate chemical strategies for enhancing the electronic and optical...

  3. Design, Fabrication, and Characterization of 3D Hollow Ceramic Nano-Architectures

    06 Dec 2018 | | Contributor(s):: Dongchan Jang

    In this work, we present a new design criterion capable of significantly abating strength degradation in lightweight materials, by successfully combining size-induced strengthening effect in nanomaterials with architectural design of cellular porous materials. Hollow-tube-based 3D ceramic...

  4. Franklin Uriel Parás Hernández

    Age: 35 years old. Male,Majored in Mechanical Engineering and graduated from Tec of Monterrey at the age of 24. Got into the Graduate School of Tec of Monterrey and got a Masters degree in Thermal...

    http://nanohub.org/members/180004

  5. Lab Exercise: Atomic Layer Deposition

    13 Jan 2017 | | Contributor(s):: NACK Network

    The objective of this lab is to evaluate the atomic layer deposition (ALD) process. The ALD process will be used to deposit a transparent conducting oxide (TCO). Principles of resistance and resistivity will also be discussed.

  6. Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)

    13 Feb 2006 | | Contributor(s):: peide ye

    Atomic layer deposition (ALD) is an emerging nanotechnology enables the deposit of ultrathin films, one atomic layer by one atomic layer. ALD provides a powerful, new capability to grow or regrow nanoscale ultrathin films of metals, semiconductors and insulators. This presentation introduces ALD...

  7. MSE 376 Lecture 1: Film Deposition Methods

    04 Oct 2006 | | Contributor(s):: Mark C. Hersam

  8. [Illinois] AVS Meeting 2012: Understanding Atomic-Layer-Deposition Synthesis of Cu 2 ZnSnS 4 Solar Cells

    03 Jun 2013 | | Contributor(s):: Sergey V. Baryshev

    Cu2ZnSnS4 (CZTS) has recently attracted attention as a light absorber for photovoltaic applications because of its band gap (εg≈1.4 eV), the relative abundance and low cost of its constituent elements (which permits large-scale low-cost module production), and its demonstrated...