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1. ECE 606 L29.2: MOS Capacitor Signal Response - Small Signal Response

   20 Jul 2023 | | Contributor(s):: Gerhard Klimeck

2. ECE 606 L29.3: MOS Capacitor Signal Response - Large Signal Response

   20 Jul 2023 | | Contributor(s):: Gerhard Klimeck

3. IWCN 2021: Computational Research of CMOS Channel Material Benchmarking for Future Technology Nodes: Missions, Learnings, and Remaining Challenges

   15 Jul 2021 | | Contributor(s):: raseong kim, Uygar Avci, Ian Alexander Young

   In this preentation, we review our journey of doing CMOS channel material benchmarking for future technology nodes. Through the comprehensive computational research for past several years, we have successfully projected the performance of various novel material CMOS based on rigorous physics...

4. ECE 606 Lecture 22: MOScap Frequence Response/MOSFET I-V Characteristics

   26 Nov 2012 | | Contributor(s):: Gerhard Klimeck

5. 

   Abdelaali Fargi

   Abdelaali Fargi received his PhD in Physics of Semiconductor Devices and Electronics from Faculty of Sciences of Monastir (Tunisia) in 2016, the Master of Science Degree in Materials Science and...

   https://nanohub.org/members/56303

6. CV profile with different oxide thickness

   20 Apr 2010 | | Contributor(s):: Saumitra Raj Mehrotra, Gerhard Klimeck

   C-V (or capacitance-voltage) profiling refers to a technique used for the characterization of semiconductor materials and devices. C-V testing is often used during the characterization process to determine semiconductor parameters, particularly in MOSCAP and MOSFET structures.C-V measurements can...

7. ECE 606 Lecture 34: MOSCAP Frequency Response

   out of 5 stars 

   16 Apr 2009 | | Contributor(s):: Muhammad A. Alam