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Modeling a Deep Reactive Ion Etching (DRIE) Process
16 Aug 2018 | Contributor(s):: Tiffany Wu
This Learning Module introduces Deep Reactive Ion Etching (DRIE) used in the fabrication of microsystems, an overview of how DRIE can be computationally modeled, and a brief conclusion of the Design for Nanomanufacturing at UC Berkeley’s research on modeling a DRIE process. Activities in...