Tags: lithography

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  1. ME 290R Lecture 4.2: Nanoimprint Lithography – Imprintable Materials II

    15 Apr 2019 |

  2. ME 290R Lecture 5: Nanoimprint Lithography – Stamp Fabrication

    15 Apr 2019 | | Contributor(s):: Taylor, Hayden

  3. ME 290R Lecture 6.1: Nanoimprint Lithography - Machine Design I

    15 Apr 2019 | | Contributor(s):: Taylor, Hayden

  4. ME 290R Lecture 6.2: Nanoimprint Lithography – Machine Design II

    15 Apr 2019 | | Contributor(s):: Taylor, Hayden

  5. ME 290R Lecture 4.1: Nanoimprint Lithography – Imprintable Materials I

    05 Apr 2019 | | Contributor(s):: Taylor, Hayden

  6. ME 290R Lecture 3.1: Nanoimprint Lithography - Process Mechanics I

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  7. ME 290R Lecture 3.2: Nanoimprint Lithography - Process Mechanics II

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  8. ME 290R Lecture 3.3: Nanoimprint Lithography - Process Mechanics III

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  9. ME 290R Lecture 3.4: Nanoimprint Lithography - Process Mechanics IV

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  10. ME 290R: Topics in Manufacturing - Nanoscale Manipulation of Materials

    27 Mar 2019 | | Contributor(s):: Taylor, Hayden

    This graduate level course surveys sub-micrometer pattern-transfer techniques with applications in semiconductor manufacturing, data storage, photonics, and surface engineering.

  11. ME 290R Lecture 1: Introduction

    27 Mar 2019 | | Contributor(s):: Taylor, Hayden

    An overview of current and emerging lithography technologies and challenges. Future lithography requirements (with reference to the International Technology Roadmap for Semiconductors). Requirements for integration of lithography with other process steps.

  12. ME 290R Lecture 2.1: Lithography Performance Criteria - Technical

    27 Mar 2019 | | Contributor(s):: Taylor, Hayden

    Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

  13. ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling)

    27 Mar 2019 | | Contributor(s):: Taylor, Hayden

    Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

  14. Adam Marc Munder

    http://nanohub.org/members/165406

  15. ECE 695Q Lecture 42: Advanced Lithography II

    02 Dec 2016 | | Contributor(s):: Minghao Qi

  16. ECE 695Q Lecture 43: Advanced Lithography III

    01 Nov 2016 | | Contributor(s):: Minghao Qi

  17. ECE 695Q Lecture 41: Advanced Lithography I

    12 Oct 2016 | | Contributor(s):: Minghao Qi

  18. ECE 695Q Lecture 38: Nanoimprint Lithography (NIL) – NIL Mold Fabrication

    12 Oct 2016 | | Contributor(s):: Minghao Qi

  19. ECE 695Q Lecture 37: Nanoimprint Lithography (NIL) - Resist for UV-NIL

    12 Oct 2016 | | Contributor(s):: Minghao Qi

  20. ECE 695Q Lecture 36: Nanoimprint Lithography (NIL) – Alignment in NIL

    28 Sep 2016 | | Contributor(s):: Minghao Qi