Tags: lithography

Online Presentations (1-20 of 59)

  1. ME 290R Lecture 12.2: Scanning-beam Lithography and Directed Self-assembly II

    15 May 2019 | | Contributor(s):: Taylor, Hayden

  2. ME 290R Lecture 11: Extreme UV Lithography

    14 May 2019 | | Contributor(s):: Taylor, Hayden

  3. ME 290R Lecture 12.1: Scanning-beam Lithography and Directed Self-assembly I

    14 May 2019 | | Contributor(s):: Taylor, Hayden

  4. ME 290R Lecture 10.3: Photolithography III

    10 May 2019 | | Contributor(s):: Taylor, Hayden

  5. ME 290R Lecture 9: Lithography for MEMS and Microfluidics

    08 May 2019 | | Contributor(s):: Taylor, Hayden

  6. ME 290R Lecture 10.1: Photolithography I

    08 May 2019 | | Contributor(s):: Taylor, Hayden

  7. ME 290R Lecture 10.2: Photolithography II

    08 May 2019 | | Contributor(s):: Taylor, Hayden

  8. ME 290R Lecture 4.2: Nanoimprint Lithography – Imprintable Materials II

    15 Apr 2019 |

  9. ME 290R Lecture 5: Nanoimprint Lithography – Stamp Fabrication

    15 Apr 2019 | | Contributor(s):: Taylor, Hayden

  10. ME 290R Lecture 6.1: Nanoimprint Lithography - Machine Design I

    15 Apr 2019 | | Contributor(s):: Taylor, Hayden

  11. ME 290R Lecture 6.2: Nanoimprint Lithography – Machine Design II

    15 Apr 2019 | | Contributor(s):: Taylor, Hayden

  12. ME 290R Lecture 4.1: Nanoimprint Lithography – Imprintable Materials I

    05 Apr 2019 | | Contributor(s):: Taylor, Hayden

  13. ME 290R Lecture 3.1: Nanoimprint Lithography - Process Mechanics I

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  14. ME 290R Lecture 3.2: Nanoimprint Lithography - Process Mechanics II

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  15. ME 290R Lecture 3.3: Nanoimprint Lithography - Process Mechanics III

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  16. ME 290R Lecture 3.4: Nanoimprint Lithography - Process Mechanics IV

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  17. ME 290R Lecture 1: Introduction

    27 Mar 2019 | | Contributor(s):: Taylor, Hayden

    An overview of current and emerging lithography technologies and challenges. Future lithography requirements (with reference to the International Technology Roadmap for Semiconductors). Requirements for integration of lithography with other process steps.

  18. ME 290R Lecture 2.1: Lithography Performance Criteria - Technical

    27 Mar 2019 | | Contributor(s):: Taylor, Hayden

    Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

  19. ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling)

    27 Mar 2019 | | Contributor(s):: Taylor, Hayden

    Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

  20. ECE 695Q Lecture 42: Advanced Lithography II

    02 Dec 2016 | | Contributor(s):: Minghao Qi