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ME 290R Lecture 12.1: Scanning-beam Lithography and Directed Self-assembly I
14 May 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 10.3: Photolithography III
10 May 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 9: Lithography for MEMS and Microfluidics
08 May 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 10.1: Photolithography I
08 May 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 10.2: Photolithography II
08 May 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 7.2: Nanoimprint Lithography – Applications II
08 May 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 7.1: Nanoimprint Lithography – Applications I
07 May 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 4.2: Nanoimprint Lithography – Imprintable Materials II
15 Apr 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 5: Nanoimprint Lithography – Stamp Fabrication
15 Apr 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 6.1: Nanoimprint Lithography - Machine Design I
15 Apr 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 6.2: Nanoimprint Lithography – Machine Design II
15 Apr 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 4.1: Nanoimprint Lithography – Imprintable Materials I
05 Apr 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 3.1: Nanoimprint Lithography - Process Mechanics I
02 Apr 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 3.2: Nanoimprint Lithography - Process Mechanics II
02 Apr 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 3.3: Nanoimprint Lithography - Process Mechanics III
02 Apr 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 3.4: Nanoimprint Lithography - Process Mechanics IV
02 Apr 2019 | | Contributor(s):: Taylor, Hayden
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ME 290R: Topics in Manufacturing - Nanoscale Manipulation of Materials
27 Mar 2019 | | Contributor(s):: Taylor, Hayden
This graduate level course surveys sub-micrometer pattern-transfer techniques with applications in semiconductor manufacturing, data storage, photonics, and surface engineering.
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ME 290R Lecture 1: Introduction
27 Mar 2019 | | Contributor(s):: Taylor, Hayden
An overview of current and emerging lithography technologies and challenges. Future lithography requirements (with reference to the International Technology Roadmap for Semiconductors). Requirements for integration of lithography with other process steps.
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ME 290R Lecture 2.1: Lithography Performance Criteria - Technical
27 Mar 2019 | | Contributor(s):: Taylor, Hayden
Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.
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ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling)
27 Mar 2019 | | Contributor(s):: Taylor, Hayden
Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.