-
Tutorial on Two Photon Lithography Tool
26 Nov 2018 | | Contributor(s):: Mohammad Mahfuzul Kabir, Varun Ajit Kelkar
Two-photon lithography (TPL) is a nano-scale 3-d fabrication technique. TPL depends upon the two-photon polymerization process, whereby two incident photons of light are absorbed by a precursor material leading to polymerization. The smallest feature size (voxel) achievable in a TPL...
-
Two Photon Lithography
06 Jul 2018 | | Contributor(s):: Mohammad Mahfuzul Kabir, Varun Ajit Kelkar, Darren K Adams, Kimani C Toussaint
Calculate voxel dimensions for a two-photon lithography process
-
ECE 695Q Lecture 42: Advanced Lithography II
02 Dec 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 43: Advanced Lithography III
01 Nov 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 41: Advanced Lithography I
12 Oct 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 38: Nanoimprint Lithography (NIL) – NIL Mold Fabrication
12 Oct 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 37: Nanoimprint Lithography (NIL) - Resist for UV-NIL
12 Oct 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 36: Nanoimprint Lithography (NIL) – Alignment in NIL
28 Sep 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 39: Nanoimprint Lithography (NIL) – NIL Tools
26 Sep 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 40: Nanoimprint Lithography (NIL) – Other NIL Approaches
26 Sep 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 32: Nanoimprint Lithography (NIL) – Overview and Thermal NIL Resists
21 Sep 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 33: Nanoimprint Lithography – Residual Layer After Nanoimprint
21 Sep 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 34: Nanoimprint Lithography – Pattern Dependence in Nanoimprint
21 Sep 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 35: Nanoimprint Lithography – UV Assisted Nanoimprint
21 Sep 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 21: E-Beam Lithography Process
20 Sep 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q: Nanometer Scale Patterning and Processing
11 Jul 2016 | | Contributor(s):: Minghao Qi
This course is a top-down approach to the fabrication of nanometer-scale (<100nm) structures. Principles of lithography, film deposition, reactive-ion etch and planarization are presented. The couse provides a survey of state-of-the-art nanofabrication techniques.
-
ECE 695Q Lecture 16: Electron Optics and Lithography I
29 Jun 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 10: Optical Lithography – Resolution Enhancement Techniques
17 Jun 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 15: Extreme UV (EUV) Lithography – Optics, Mask, Resist, and Contaminaton Control
17 Jun 2016 | | Contributor(s):: Minghao Qi
-
ECE 695Q Lecture 17: Electron Optics and Lithography II
16 Jun 2016 | | Contributor(s):: Minghao Qi