Find information on common issues.
Ask questions and find answers from other users.
Suggest a new site feature or improvement.
Check on status of your tickets.
2010 Honorary Symposium for Professor Milton Feng at The Micro and Nano Technology Laboratory UIUC
23 Jul 2010 | Series | Contributor(s): Rashid Bashir, Andreas Cangellaris, Omar N Sobh
Symposium honoring Professor Milton Feng on his 60th birthday.
4.0 out of 5 stars
01 May 2007 | Tools | Contributor(s): J. L. Gray, Michael McLennan
Simulates 1D heterostructures, including solar cells
CAD of MEMS & NEMS: State of the Art & Future Challenges
5.0 out of 5 stars
24 Feb 2008 | Online Presentations | Contributor(s): Andreas Cangellaris
Computer aided design environments are very mature and used extensively for the design of every integrated electronical component that is commercially available to all of us. This presentation...
31 Oct 2006 | Tools | Contributor(s): M. E. Klausmeier-Brown, C. M. Maziar, P. E. Dodd, M. A. Stettler, Xufeng Wang, Gerhard Klimeck
Improved program consists of DEMON and SDEMON
How Semiconductors and Transistors Work
0.0 out of 5 stars
20 Nov 2005 | Animations | Contributor(s): John C. Bean
This animation shows how semiconductor crystals work and how they are used to make transistor switches.
Illinois Tools: MOCA
28 Mar 2007 | Tools | Contributor(s): Mohamed Mohamed, Umberto Ravaioli, Nahil Sobh, derrick kearney
A 2D Full-band Monte Carlo (MOCA) Simulation of SOI Device Structures
Introduction to Schred
28 Jun 2007 | Learning Modules | Contributor(s): James K Fodor, Jing Guo
This learning module introduces nanoHUB users to the Schred simulator. A brief introduction to Schred is presented, followed by voiced presentations featuring the simulator in action. Upon...
4.5 out of 5 stars
13 May 2004 | Tools | Contributor(s): Steven Clark
Modeling Interface-defect Generation (MIG)
18 Jul 2006 | Tools | Contributor(s): Ahmad Ehteshamul Islam, Haldun Kufluoglu, Muhammad A. Alam
Analyzes device reliability based on NBTI
Modeling Single and Dual-Gate Capacitors using SCHRED
31 Mar 2006 | Learning Modules | Contributor(s): Dragica Vasileska
SCHRED stands for self-consistent solver of the 1D Poisson and 1D effective mass Schrodinger equation as applied to modeling single gate or dual-gate capacitors. The program incorporates many...
Molecular Beam Epitaxy
16 Nov 2005 | Animations | Contributor(s): John C. Bean
Microelectronic devices are made by repeating two steps: 1) Depositing a thin uniform layer of material; 2) Then using a photographic process to pattern and remove unwanted areas of that layer.
MOSCap Demonstration: MOS Capacitor Simulation
11 Jun 2009 | Animations | Contributor(s): Gerhard Klimeck, Benjamin P Haley
This video shows the simulation of a MOS capacitor using the MOSCAP tool. Several powerful analytic features of this tool are demonstrated.
MOSFet Demonstration: MOSFET Device Simulation and Analysis
This video shows the simulation and analysis of a MOSFET device using the MOSFet tool. Several powerful analytic features of this tool are demonstrated.
06 Feb 2007 | Tools | Contributor(s): Wei Zhao, Yu Cao
Predictive model files for future transistor technologies.
12 Jan 2006 | Tools | Contributor(s): Mark R. Pinto, kent smith, Muhammad A. Alam, Steven Clark, Xufeng Wang, Gerhard Klimeck, Dragica Vasileska
2D/3D devices under steady state, transient conditions or AC small-signal analysis
PN Junction Lab
12 Sep 2005 | Tools | Contributor(s): Dragica Vasileska, Matteo Mannino, Michael McLennan, Xufeng Wang, Gerhard Klimeck, Saumitra Raj Mehrotra, Benjamin P Haley
This tool enables users to explore and teach the basic concepts of P-N junction devices.
PN Junction Lab Demonstration: Asymmetric PN Junctions
This video shows the simulation and analysis of a several PN junctions using PN Junction Lab, which is powered by PADRE. Several powerful analytic features of this tool are demonstrated.
Process Lab: Concentration-Dependent Diffusion
09 Oct 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin
This modules simulates both the standard diffusion and concentration-dependent diffusion.
Process Lab: Defect-coupled diffusion
3.0 out of 5 stars
This tool simulates dopant diffusion coupled with point defects.
Process Lab: Oxidation Flux
This module simulates the oxidation flux.