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Tags: MOSFET

Description

The metal–oxide–semiconductor field-effect transistor is a device used for amplifying or switching electronic signals. In MOSFETs, a voltage on the oxide-insulated gate electrode can induce a conducting channel between the two other contacts called source and drain. The channel can be of n-typeor p-type, and is accordingly called an nMOSFET or a pMOSFET (also commonly nMOS, pMOS). It is by far the most common transistor in both digital and analog circuits, though the bipolar junction transistor was at one time much more common. More information on MOSFET can be found here.

Resources (41-60 of 108)

  1. Lecture 1: Review of MOSFET Fundamentals

    26 Aug 2008 | Online Presentations | Contributor(s): Mark Lundstrom

    A quick review of the traditional theory of the MOSFET along with a review of key device performance metrics. A short discussion of the limits of the traditional (drift-diffusion) approach and...

    http://nanohub.org/resources/5307

  2. Electronics From the Bottom Up: top-down/bottom-up views of length

    17 Aug 2007 | Online Presentations | Contributor(s): Muhammad A. Alam

    When devices get small stochastic effects become important. Random dopant effects lead to uncertainties in a MOSFET’s threshold voltage and gate oxides breakdown is a random process. Even...

    http://nanohub.org/resources/2974

  3. CMOS-Nano Hybrid Technology: a nanoFPGA-related study

    04 Apr 2007 | Online Presentations | Contributor(s): Wei Wang

    Dr. Wei Wang received his PhD degree in 2002 from Concordia University, Montreal, QC, Canada, in Electrical and Computer Engineering. From 2002 to 2004, he was an assistant professor in the...

    http://nanohub.org/resources/2567

  4. MSE 376 Lecture 13: Nanoscale CMOS, part 2

    31 Mar 2007 | Online Presentations | Contributor(s): Mark Hersam

    http://nanohub.org/resources/2538

  5. MSE 376 Lecture 12: Nanoscale CMOS, part 1

    31 Mar 2007 | Online Presentations | Contributor(s): Mark Hersam

    http://nanohub.org/resources/2537

  6. Faster Materials versus Nanoscaled Si and SiGe: A Fork in the Roadmap?

    20 Apr 2004 | Online Presentations | Contributor(s): Jerry M. Woodall

    Strained Si and SiGe MOSFET technologies face fundamental limits towards the end of this decade when the technology roadmap calls for gate dimensions of 45 nm headed for 22 nm. This fact, and...

    http://nanohub.org/resources/163

  7. Nanoelectronics and the Future of Microelectronics

    22 Aug 2002 | Online Presentations | Contributor(s): Mark Lundstrom

    Progress in silicon technology continues to outpace the historic pace of Moore's Law, but the end of device scaling now seems to be only 10-15 years away. As a result, there is intense interest in...

    http://nanohub.org/resources/141

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