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A Primer on Semiconductor Device Simulation
out of 5 stars
23 Jan 2006 | | Contributor(s):: Mark Lundstrom
Computer simulation is now an essential tool for the research and development of semiconductor processes and devices, but to use a simulation tool intelligently, one must know what's "under the hood." This talk is a tutorial introduction designed for someone using semiconductor device simulation...
BME 695L Lecture 15: GMP and Issues of Quality Control Manufacture of Nanodelivery Systems
10 Nov 2011 | | Contributor(s):: James Leary
See references below for related reading.15.1 Overview15.1.1 What does cGMP mean?15.1.2 Why GMP? Controlling processes means more predictable...
BME 695N Lecture 20: GMP and issues of quality control manufacture of nanodelivery systems
15 Nov 2007 | | Contributor(s):: James Leary
Outline:Overview What does cGMP mean? Why GMP? Controlling processes means more predictable outcomes… Enforcement What can be learned from the semi-conductor industry clean-room and manufacturing? What doesn’t fit this paradigm?cGMP-level manufacturing Predictable methods lead to predictable...
BNC Annual Research Symposium: Nanoscale Energy Conversion
23 Apr 2007 | | Contributor(s):: Timothy S Fisher
This presentation is part of a collection of presentations describing the projects, people, and capabilities enhanced by research performed in the Birck Center, and a look at plans for the upcoming year.
BNC Research Review: The Birck Nanotechnology Center-Progress, Opportunitiees, and Challenges
04 Jun 2008 |
Chemically Enhanced Carbon-Based Nanomaterials and Devices
09 Nov 2010 | | Contributor(s):: Mark Hersam
Carbon-based nanomaterials have attracted significant attention due to their potential to enable and/or improve applications such as transistors, transparent conductors, solar cells, batteries, and biosensors. This talk will delineate chemical strategies for enhancing the electronic and optical...
ECE 612 Lecture 18A: CMOS Process Steps
12 Nov 2008 | | Contributor(s):: Mark Lundstrom
Outline: 1) Unit Process Operations,2) Process Variations.
ECE 612 Lecture 18B: CMOS Process Flow
18 Nov 2008 | | Contributor(s):: Mark Lundstrom
For a basic, CMOS process flow for an STI (shallow trench isolation process), see: http://www.rit.edu/~lffeee/AdvCmos2003.pdf.This lecture is a condensed version of the more complete presentation (listed above) by Dr. Fuller.
ECE 695Q Lecture 01: Introduction
12 May 2016 | | Contributor(s):: Minghao Qi
ECE 695Q Lecture 02: Overview of Lithography
ECE 695Q Lecture 03: Lithography Used In Semiconductor Manufacturing
01 Jun 2016 | | Contributor(s):: Minghao Qi
ECE 695Q Lecture 04: Contamination Control and Substrate Cleaning
ECE 695Q Lecture 05: Resist Technology
06 Jun 2016 | | Contributor(s):: Minghao Qi
ECE 695Q Lecture 06: Optical Lithography - Optical Imaging System
03 Jun 2016 | | Contributor(s):: Minghao Qi
ECE 695Q Lecture 07: Optical Lithography – Lithography System
ECE 695Q Lecture 08: Optical Lithography – Alignment
ECE 695Q Lecture 09: Optical Lithography - Position Detection
ECE 695Q Lecture 10: Optical Lithography – Resolution Enhancement Techniques
17 Jun 2016 | | Contributor(s):: Minghao Qi
ECE 695Q Lecture 11: Optical Lithography – Resolution Enhancement Techniques II
ECE 695Q Lecture 12: Optical Lithography – Contrast and Resolution in Microscopy and Lithography Systems