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Samuel Gallego Parra
Golam Rabbani Edi
[Illinois] Epigenetics With Semiconductor Nanotechnology
13 Apr 2017 | Contributor(s):: Aditya Sarathy
DNA methylation is an epigenetic modification involving the addition of a methyl group to DNA, which is heavily involved in gene expression and regulation, thereby critical to the progression of diseases such as cancer. In this work we show that detection and localization of DNA methylation can...
ECE 695Q Lecture 03: Lithography Used In Semiconductor Manufacturing
01 Jun 2016 | | Contributor(s):: Minghao Qi
Sep 02 2015
18th International Workshop on Computational Electronics
Juan Camilo Lopez
[Illinois] Atomic Engineering of III-V Semiconductor for Quantum Devices, from Deep UV (200 nm) to THZ (300 microns)
03 Mar 2015 | | Contributor(s):: Manijeh Razeghi
Nature offers us different kinds of atoms. But it takes human intelligence to put different atoms together in an elegant way in order to realize manmade structures that is lacking in nature. This is especially true in III-V semiconductor material systems. Guided by highly accurate atomic band...
is there a way to calculate electronic structure of highly mismatched semiconductor alloys ?
Closed | Responses: 0
how one can perform electronic structure calculations of familly of highly mismatched semiconductor alloys for some given composition proportion?
[Illinois] Genomics with Semiconductor Nanotechnology
29 Dec 2014 | | Contributor(s):: Jean-Pierre Leburton
The single-atom thickness of monolayer graphene makes it an ideal candidate for DNA sequencing as it can scan molecules passing through a nanopore at high resolution. Additionally, unlike most insulating membranes, graphene is electrically active, and this property can be exploited to control and...
Francisco Jr. Franco
Davis Solomon Darvish
Uniaxial and Biaxial Stress Strain Calculator for Semiconductors
16 Jan 2014 | | Contributor(s):: Jamie Teherani
Simulate stress or strain along user-defined Miller directions for arbitrary stress/strain configurations.
Structure and Morphology of Silicon Germanium Thin Films
30 Dec 2013 | | Contributor(s):: Brian Demczyk
Single layer silicon and germanium films as well as nominally 50-50 silicon-germanium alloys were deposited on single crystal silicon and germanium (001) and (111) substrates by ultrahigh vacuum chemical vapor deposition. These films spanned the range of + 4 % film-substrate lattice mismatch. A...