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Structure and Morphology of Silicon-Germanium Thin Films
07 Feb 2015 | Contributor(s):: Brian Demczyk
This presentation describes the growth of (Si,Ge & SiGe) thin films on Si and Ge (001) and (111) substrates by ultrahigh vacuum chemical vapor deposition (UHVCVD). Thin films were characterized structurally by conventional and high-resolution transmission electron microscopy (TEM) and...
Structure and Morphology of Silicon Germanium Thin Films
30 Dec 2013 | Contributor(s):: Brian Demczyk
Single layer silicon and germanium films as well as nominally 50-50 silicon-germanium alloys were deposited on single crystal silicon and germanium (001) and (111) substrates by ultrahigh vacuum chemical vapor deposition. These films spanned the range of + 4 % film-substrate lattice mismatch. A...
On the Two to Three Dimensional Growth Transition in Strained Silicon Germanium Thin Films
02 Feb 2012 | | Contributor(s):: Brian Demczyk
Utilizing a model adapted from classical nucleation theory , we calculate a "critical thickness" for island formation, taking into account the surfaceenergies of the deposit and the substrate and the elastic modulus of the deposit, to which experimental results for CVD grown silicon germanium...