Introduction to TCAD Simulation

The existing semiconductor industry is now fundamentally built on the assumption that almost every aspect of a chip is first designed in software.

Process simulation provides the ability to optimize and control the various processing steps, such as implantation, oxidation, diffusion, etching, and deposition, among others. Prophet and TSuprem are tools of choice on nanoHUB.org for this endeavor. However, learning about the basics of process simulation may be daunting at first, and there are four simplified process labs available in this tool set that guide students towards full-blown process simulation.

Device simulation either takes in-process simulation data or assumes certain device geometries, doping profiles, etc. and simulates electrical device performances. PADRE and Schred are tools of choice on nanoHUB.org for this simulation step. PADRE is a full-fledged simulation environment for semiclassical device simulation. It has a complicated input language that may be inappropriate for usage in those classroom environments where simple device modeling concepts need to be introduced. Drift-Diffusion Lab, PN junction Lab, MOScap, and MOSFET are simplified GUI-driven tools that enable students (and professionals) to easily configure PADRE without requiring the user to master the PADRE input language.

Circuit simulation ultimately provides system level design capabilities. nanoHUB.org has a sinple interface to the Berkeley Spice3f4 for such usages.

This nanoHUB “topic page” provides an easy access to selected nanoHUB Semiconductor Device Education Material that is openly accessible and usable by everyone around the world.

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