Due to local system maintenance on Tuesday, September 27th, nanoHUB will be unable to launch simulation jobs on clusters conte, rice, carter, and hansen. We apologize for any inconvenience.

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Equipment

Thermal

Equipment home > Fabrication > Thermal

Horizontal Furnace

Horizontal furnaces are used for a variety of processes including oxidation, nitride and polysilicon deposition, and annealing. They can also be used to transfer dopants to the surface of wafers and to drive the dopants into the crystal.

RTP

RTP stands for Rapid Thermal Processing, that process used to rapidly heat a substrate to a high temperature for a very short time. This process is used to repair damaged crystalline structures and to activate ion implanted dopants.

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