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Cambridge Nanotech Fiji ALD

Equipment home > Deposition > Cambridge Nanotech Fiji ALD

General Information:

Coral Name: Fiji200_ALD
FIC: Zhihong Chen
Process/Equipment Owner: John Coy
Location: Cleanroom Bay G
Max Wafer Size: 8

System Information:

General Description:

General use ALD for Al2O3, and HfO2, TiO2


Easily configurable for other materials

Materials Compatibility:

Clean, vacuum compatible non-outgassing materials. Check with John Coy for compatibality.

Useful Links:

* Must install Coral and be a trained user to reserve a slot on this system.