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Equipment

GaN MBE

General Information:

FIC: Michael Manfra
Process/Equipment Owner: Geoff Gardner
Location: BNC Lab 2277

System Information:

General Description:

The RIBER 2000 Molecular Beam Epitaxy (MBE) System is capable of growing on 2" substrates. This MBE features a Load Lock chamber, Reflective High Energy Electron Diffraction (RHEED) and automation software. Sources include nitrogen plasma, Ga, In, Al, and Si for doping.

Materials Compatibility:

Check with Michael Manfra

Notes:

This tool has restricted use policies. However samples and structures can be considered for fabrication on an individual basis.

Useful Links:

* Must install Coral and be a trained user to reserve a slot on this system.