DATE CHANGE: nanoHUB could be intermittently unavailable on 05/06 from 8:00 am – 1:00 pm (EST) for scheduled maintenance. All tool sessions will expire on 05/06 at 8:00 am (EST).
Coral Name: pld
FIC: Tim Sands
Process/Equipment Owner: Dave Lubelski
Location: BRK 1217
Max Wafer Size: 2
Versatile pulsed laser deposition system dedicated to oxides
Manufacturer: PVD Products, Inc.
Samples up to 2” diameter wafers
Max substrate temperature
sapphire = 800°C
silicon = 900°C
heating via IR lamps
three 2”dia. x 0.25”thick target holders
smaller target sizes possible
current available targets: Ag, Al, Co, Cr, Cu, Fe, Ga, In, Mo, Sc, Ta, Ti, V, W, Zr
Lambda Physik 305i KrF excimer laser (see manual below)
uniform rastering across target via rotation and mirror
base pressure <810-8 Torr
* Must install Coral and be a trained user to reserve a slot on this system.